Research method of silicon-based microstructure deformation mechanism based on phase field model at high temperature
A silicon-based microstructure and model technology, applied in the micro-nano field, can solve problems such as limitations in understanding particle diffusion, and achieve the effect of reducing complexity
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[0049] The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0050] The drawings involved in this embodiment are all simplified schematic diagrams, which merely illustrate the basic structure of the present invention in a schematic manner, and therefore, only show the structures related to the present invention.
[0051] Build as figure 1 As shown in the experimental bench, the silicon-based microstructure material used is a polished 6-in (100) n-type silicon wafer; the raw material is placed in an 88°C environment for 90 seconds to soften it; the processed The sample is manufactured using an ion etching machine such as figure 2 U-shaped cylindrical hole shown;
[0052] Such as image 3 As shown, the U-shaped cylindrical hole sample is placed in an environment of 1150°C for 3 minutes;
[0053] Such as Figure 4 As shown, a schematic diagram of the morphological change of the silicon-based microstructure i...
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