A method for cleaning wafers with a multi-station turret device specially used for washing and drying equipment

A multi-station, turret technology, applied in the directions of cleaning methods and utensils, chemical instruments and methods, electrical components, etc., can solve the problems of low working efficiency of the turret, lower qualified rate of finished products, poor cleaning effect, etc., and achieve good cleaning. effect, improve work efficiency, and facilitate disassembly

Active Publication Date: 2019-02-22
THE 45TH RES INST OF CETC
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Problems solved by technology

[0003] The present invention proposes a method for cleaning wafers with a special multi-station turntable device for washing and drying equipment. It is necessary to solve the problem of low working efficiency of the turntable of traditional washing and drying equipment, worse drying effect, low dynamic balance value, and poor cleaning effect. Poor and technical problems of lower pass rate of finished products

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  • A method for cleaning wafers with a multi-station turret device specially used for washing and drying equipment
  • A method for cleaning wafers with a multi-station turret device specially used for washing and drying equipment
  • A method for cleaning wafers with a multi-station turret device specially used for washing and drying equipment

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Embodiment Construction

[0035] The multi-station turntable device of this washing and drying equipment includes a turntable bottom plate 2 arranged horizontally, a turntable upper plate 1 that is directly above the turntable bottom plate 2 and is parallel to the turntable bottom plate 2, and is vertically located on the turntable bottom plate 2. The station structure between the frame bottom plate 2 and the turntable upper plate 1; there are at least two identical station structures on the turntable device, and these station structures are evenly spaced and divided on the turntable device; the turntable device A vertical turntable small shaft 5 is also provided at the center position of the upper surface of the frame upper plate 1 .

[0036] Such as Figure 1 to Figure 6 As shown, in this embodiment, the same station structure is arranged on the turntable device, which is symmetrical about the rotation center of the turnframe device at 180°. At this time, since there are two stations, the upper plate...

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Abstract

The invention relates to a multi-station rotating stand device for washing and drying equipment and a method for cleaning a wafer. The rotating stand device comprises a rotating stand base plate arranged horizontally, a rotating stand upper plate, and station structures; and the rotating stand upper plate arranged right above the rotating stand base plate is parallel to the rotating stand base plate and the station structures are arranged between the rotating stand base plate and the rotating stand upper plate vertically. At least two identical station structures are arranged on the rotating stand device and are distributed on the rotating stand device uniformly at intervals. Besides, a rotating stand small shaft arranged vertically is arranged at the center of the upper surface of the rotating stand upper plate. According to the invention, technical problems of low rotating standing working efficiency, poor drying effect, low dynamic balance value, poor cleaning effect, and reduced finished product yield of the traditional washing and drying equipment can be solved.

Description

technical field [0001] The invention relates to a method for cleaning wafers using a multi-station turntable device. Background technique [0002] With the continuous expansion and development of IC and related industries, washing and drying equipment has become an indispensable and important equipment for material cleaning in the cleaning process, and the special turntable for washing and drying equipment is an indispensable device on the equipment . The turntable of traditional washing and drying equipment is generally directly connected to the equipment motor through the bottom rotating shaft, and because the traditional turntable adopts a single station, it can only carry one three-dimensional wafer rack, and the work efficiency is low; secondly, the rotation center of the turntable and The center of the loaded wafer is concentric, and the wafer is not easy to be dried when it is close to the rotation center during the drying process. The closer to the rotation center, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/02B08B13/00
CPCB08B13/00H01L21/02041H01L21/67023H01L21/67028H01L21/67034
Inventor 王文丽陈仲武祝福生夏楠君王丽江张伟锋
Owner THE 45TH RES INST OF CETC
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