Process for preparing nanometer metal oxide powder by DC plasma method

A nano metal and oxide powder technology, applied in tin oxide, nanotechnology, gallium/indium/thallium compounds, etc., can solve the problems of easy agglomeration of nanoparticles, complex preparation process, environmental pollution, etc., and achieve good particle dispersion, Simple process, high purity effect
CN106044849BActive Publication Date: 2018-01-26725TH RES INST OF CHINA SHIPBUILDING INDAL CORP

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
725TH RES INST OF CHINA SHIPBUILDING INDAL CORP
Publication Date
2018-01-26

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Abstract

A technology for preparing nano-metallic oxide powder with a DC (direct-current) plasma method comprises steps as follows: a high-purity metal block is put into a smelting furnace and is melted, and a melt delivery tube connected with the smelting furnace is heated; a reaction chamber is subjected to vacuum pumping until the pressure reaches 2-10 MPa, cooling air is introduced into the reaction chamber, and cooling water is introduced into a reactor interlayer arranged in the reaction chamber; an arc plasma gasification system power source of a reactor is switched on, gasification current is adjusted to 10-2,000 A, and voltage is adjusted to 5-400 V; inert gas is introduced into the metal melt, the melt delivery tube is adopted for flow guidance, the gasification reaction is performed, and metal jet is formed; the metal jet is gasified under the action of arc plasma so as to form atomic clusters, the atomic clusters are subjected to a reaction with oxygen, oxide nanoparticles are formed, is condensed under cold-air negative pressure and enters a powder collecting chamber with cold air flow, and the nano-metallic oxide powder is obtained. The technology is simple, does not need a plasma source and has high yield, and the prepared nano-metallic oxide powder is not prone to agglomeration, is high in purity and facilitates large-scale production.
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Description

technical field

[0001] The invention relates to a preparation process of nanometer materials, in particular to a process for preparing nanometer metal oxide powder by a direct current plasma method. Background technique

[0002] The patent publication number is CN1381304, and the Chinese invention patent titled "Device and method for preparing micron and nanoscale powder materials by DC arc plasma" has applied for and disclosed the preparation of oxide raw materials by physical vapor deposition directly by using a plasma heat source. Micro-nano Sb 2 o 3 , SiO 2 and other powders. The patent publication number is CN102515233, and the Chinese invention patent titled "A Method for Preparing Alumina Using Thermal Plasma and Its Products" applies for and discloses the preparation of micronano-alumina by using a thermal plasma source to gasify aluminum powder Powder. These two methods both use an external plasma heat source to vaporize the material, and then deposit it to pre...

Claims

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