Polytetrafluoroethylene filament doup structure filter material base cloth and preparation method thereof

A technology of polytetrafluoroethylene and filament, which is applied in the textile field, can solve the problems of high temperature-resistant filter material, such as high weight, unreachable performance, and high price, so as to overcome poor cohesion, improve product quality, and reduce usage Effect

Inactive Publication Date: 2016-11-09
JIANGSU HUAYUE TEXTILE NEW MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the relatively high weight of PTFE high temperature resistant filter material, it is generally 500-800g / m 2 , PTFE filament or short fiber is mainly imported from abroad, and the price is expensive. Although PTFE filament or short fiber has been domestically produced, its performance cannot meet the requirements of imported materials, and its quality is unstable, which affects the use effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Polytetrafluoroethylene filament doup structure filter material base cloth and preparation method thereof
  • Polytetrafluoroethylene filament doup structure filter material base cloth and preparation method thereof
  • Polytetrafluoroethylene filament doup structure filter material base cloth and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0020] The utility model relates to a polytetrafluoroethylene filament twisted heddle structure filter material base cloth, which is composed of two systems of twisted warp and ground warp. When weaving, the position of the ground warp does not change, and the twisted warp is sometimes on the left side of the ground warp, and sometimes on the right side of the ground warp.

[0021] The weaving method adopted by the twisted heddle structure base fabric is to weave a weft yarn every time the twisted warp changes its left and right positions;

[0022] When the twisted heddle structure base fabric is put on the machine, the warp yarns of the twisted heddle part need to be threaded in two steps. First, the ground warp and the twisted warp are respectively inserted into the ordinary healds at the rear, and then inserted into the twisted heddle. Among them, the heddle worn by twisted sutras is the back heald, and the heald worn by the ground warp is the ground heald. According to th...

Embodiment 2

[0032] The utility model relates to a polytetrafluoroethylene filament twisted heddle structure filter material base cloth, which is composed of two systems of twisted warp and ground warp. When weaving, the position of the ground warp does not change, and the twisted warp is sometimes on the left side of the ground warp, and sometimes on the right side of the ground warp.

[0033] The weaving method adopted by the twisted heddle structure base fabric is to weave a weft yarn every time the twisted warp changes its left and right positions;

[0034] When the twisted heddle structure base fabric is put on the machine, the warp yarns of the twisted heddle part need to be threaded in two steps. First, the ground warp and the twisted warp are respectively inserted into the ordinary healds at the rear, and then inserted into the twisted heddle. Among them, the heddle worn by twisted sutras is the back heald, and the heald worn by the ground warp is the ground heald. According to th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The invention discloses polytetrafluoroethylene filament doup structure filter material base cloth and a preparation method thereof. Specifically, doup fabric base cloth is obtained by adopting a woven doup structure for weaving, wherein the doup fabric base cloth consists of two systems, namely doup wraps and ground warps which are twisted mutually, and yarn holes are formed at twist points of the two warps; during weaving, a piece of weft yarn is woven every time the doup wraps are changed between left and right positions; on the premise of ensuring the using performance of a filter material, the using amount of a raw material is reduced to realize the purpose of cost saving, and the problems of poor cohesive force of filaments in a texture, and difficult weaving are overcome, damage to PTFE base cloth caused by needling can be avoided or reduced, thereby improving product quality, performance and service life of the filter material.

Description

technical field [0001] The invention belongs to the technical field of textiles, and in particular relates to a polytetrafluoroethylene filament twisted heddle structure filter material base cloth and a preparation method thereof. Background technique [0002] In recent years, smog has appeared in a large area and for a long time in my country. Air pollution not only seriously affects people's life and human health, but also sounds the alarm for my country's current production and consumption patterns. It is extremely urgent to speed up environmental governance and transform the mode of economic growth. Filtration and separation technology is one of the important means to control air pollution, especially the bag filter used in filtering textiles can collect 99.3% of fine powder, especially PM10 and PM2.5, and has become the first choice for air dust pollution at home and abroad way of governance. [0003] The polytetrafluoroethylene (PTFE) fiber high temperature resistant...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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IPC IPC(8): D03D19/00D03D13/00D03D1/00B01D39/16
CPCD03D19/00B01D39/1623D03D1/00D03D13/008D10B2321/042D10B2505/04
Inventor 郭华郭玉顺陈晓峰徐国华
Owner JIANGSU HUAYUE TEXTILE NEW MATERIAL TECH
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