A chiral superstructure employing metal silicides
A metal silicide, superstructure technology, applied in the optical field, can solve the problems of the wide application of chiral superstructure, the inability to match the semiconductor processing integration technology, the inability to obtain the maximum value of circular dichroism and polarization rotation at the same time, etc.
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[0011] The present invention will be described in further detail below in conjunction with the accompanying drawings, but it should not be understood that the scope of the above-mentioned theme of the present invention is limited to the above-mentioned embodiments.
[0012] Such as Figure 1-3 As shown, a chiral superstructure adopting metal silicide includes an upper silicide layer 4, a dielectric layer 3, a lower silicide layer 2 and a substrate layer 1 arranged in sequence along the incident direction of light; the upper silicide layer 4 1. The dielectric layer 3 and the lower silicide layer 2 have the same planar structure, the planar structure includes a plurality of unit structures with a period of p, and the unit structure is composed of four centrally symmetrical rings and crossed rectangles, the rings The inner diameter is r1, the outer diameter of the ring is r2, the length of the rectangle is l, and the width of the rectangle is m=r2-r1; the thickness of the upper s...
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