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Apparatus for inspecting film formed on substrate

一种检查装置、成膜的技术,应用在测量装置、采用光学装置、仪器等方向,能够解决不恒定、基板显示不良、成膜与基板边缘部分水平及垂直距离歪斜等问题

Inactive Publication Date: 2016-12-14
SEMISYSCO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] At this time, in the process of manufacturing the substrate of the LCD or OLED, the plurality of films formed by coating on the surface of the substrate should be aligned according to the coating, and if the alignment is defective, the There is a problem of poor display of the substrate
[0012] That is, when coating and forming a film on the surface of a substrate, the horizontal and vertical distances between the film and the edge portion of the substrate should be constant, but when coating and forming a film on the surface of the substrate, often the applied The horizontal and vertical distances between the film formation and the edge of the substrate are skewed and not constant, and there is no device for checking the skew of this film formation in the past

Method used

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  • Apparatus for inspecting film formed on substrate
  • Apparatus for inspecting film formed on substrate
  • Apparatus for inspecting film formed on substrate

Examples

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Embodiment Construction

[0031] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0032] figure 1 A side view showing the structure of a substrate film formation inspection device as an embodiment of the present invention, figure 2 A plan view showing the structure of a substrate film formation inspection device as an embodiment of the present invention, image 3 To show a schematic diagram of image information of a substrate on which a film is formed by a camera module as an embodiment of the present invention, Figure 4 as an embodiment of the present invention image 3 The enlarged view of is an enlarged view of the edge portion of the substrate coated with a single-layer film formation, Figure 5 It is a block diagram schematically showing a substrate film formation inspection device as an embodiment of the present invention.

[0033] refer to Figure 1 to Figure 5 , the substrate film formation inspection device provided by the embodiment ...

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Abstract

The invention discloses an apparatus for inspecting film formed on substrate including an substrate film inspection apparatus that includes: an inspection bench; an illumination module; a camera for performing row-by-row scanning photographing to surface of a substrated that is coated by a film in a single-layer or a multi-layer manner, and for performing row-by-row scanning photographing to transversal and vertical edges of the substrate; an inspection unit which respectively calculates the distance from the film, which is formed in a single-layer or a multi-layer manner on the substrate, to the transversal and vertical edges of the substrate by means of the image information that are photographed by the camera, and also inspects whether the calculated distance is deviated, wherein the distance mentioned hereinbefore is calculated by multiplying the number of pixels between the film, which is formed in a single-layer or a multi-layer manner on the substrate, and the transversal and vertical edges of the substrate by means of the image information that are photographed by the camera by the basic length of each single pixel.

Description

[0001] This application is a divisional application of the invention patent application with the filing date of January 13, 2012, the application number of 201210013362.5, and the title of "substrate film formation inspection device". technical field [0002] The present invention relates to a technique for inspecting whether a film (for example, polyimide) is defective or not, which is applied to a substrate used in an Organic Light Emitting Diode (OLED) or a liquid crystal display (hereinafter referred to as "" Substrate"), especially relates to a substrate film formation inspection device capable of inspecting the deflection of the film formed on the surface of the substrate by measuring the distance between the film formed on the surface of the substrate and the edge of the substrate. Background technique [0003] A thin film transistor liquid crystal display device is generally composed of a lower substrate for forming a thin film transistor, an upper substrate for formi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/88G01B11/02H01L21/66
CPCH01L22/12G01B11/02G01N21/88G02F1/1309G02F1/1339G01B11/14H10K50/84H10K71/00
Inventor 李淳钟禹奉周朴炳澯
Owner SEMISYSCO CO LTD