Knurling tool and knurling system

Abstract

The invention provides a knurling tool and a knurling system; the knurling tool comprises the following structures: a knife bar comprising a mount end connected with a machine tool and a knurling end disconnected from the machine tool, and the knife bar is used for realizing machine tool feeding; a knurling unit sleeved on the knife bar and used for carrying out surface knurling treatment on an annular structure fracture; a locking device arranged on the knurling end of the knife bar and used for fixing the knurling unit on the knife bar. The knurling unit and the machine tool can be connected through the knife bar; the knurling unit is sleeved on the knife bar, and fixed by the locking device; the knurling unit is matched with the knife bar, and machine tool feeding is realized so as to form extrusion on the knurling unit and annular structure fracture surface, thus allowing the knurling unit to carry out knurling treatment on the annular structure fracture surface; the machine tool feeding can allow the knurling tool to carry out standardization processing on ring patterns on the annular structure fracture, thus improving product qualified rate and stability, reducing abnormity rate, and reducing product manufacture cost.

Description

technical field [0001] The invention relates to the field of mechanical processing, in particular to a knurling knife and a knurling system. Background technique [0002] In the semiconductor sputtering process, in order to improve the uniformity of sputtering deposition, a ring structure is usually placed in the sputtering equipment to constrain the trajectory of the sputtered particles, that is, the ring structure Play the role of focusing high-energy particles. [0003] Specifically, refer to figure 1 , shows a schematic structural diagram of a sputtering device in the prior art. [0004] The sputtering target 10 is disposed above the surface to be deposited 11 , and the ring structure 12 is disposed between the sputtering target 10 and the surface to be deposited 11 . Particles produced by the high-energy particles 13 bombarding the sputtering target 10 fall on the surface to be deposited 11 , and some are adsorbed on the surface of the fracture 12 of the ring structu...

AI Technical Summary

Problems solved by technology

[0006] However, the manual knurling method often used in the prior art cannot be standardized, which affects the pass rate and stability of the pattern.

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