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A uniform injection method of diamond abrasive grains by electromagnetic field atomization

A spraying method, diamond technology, applied in the direction of grinding device, metal processing equipment, spray discharge device, etc., can solve the problem of uneven distribution of abrasive particles, and achieve the effect of improving atomization effect and improving uniformity

Active Publication Date: 2019-12-06
HUNAN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the problem of uneven distribution of abrasive grains in the preparation of small-diameter diamond grinding wheels, and to provide a uniform spraying method of diamond abrasive grains atomized by an electromagnetic field

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  • A uniform injection method of diamond abrasive grains by electromagnetic field atomization
  • A uniform injection method of diamond abrasive grains by electromagnetic field atomization

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Embodiment Construction

[0026] As shown in the figure below, a specific embodiment of the present invention is a method for uniformly spraying diamond abrasive grains atomized by an electromagnetic field. The device includes a worktable (1), a support column (2), a cylindrical permanent magnet (3), a receiving Plate (4), diamond abrasive grain (5), electrode ring (6), annular permanent magnet (7), fixing block (8), fastening screw (9), nozzle body (10), nozzle top cover (11) , interface (12), needle electrode (13), insulating sleeve (14), infusion catheter I (15), metering pump (16), infusion catheter II (17), agitator (18), liquid storage tank (19 ), high-voltage electrostatic generator (20), electrode ring support rod (21). The liquid storage tank (19) contains a mixed liquid of diamond abrasive grains, grease and emulsifier. The agitator (18) is inserted into the liquid in the liquid storage tank (19); one end of the infusion conduit II (17) is inserted into the liquid in the liquid storage tank ...

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Abstract

The invention belongs to the technical field of electrostatic atomization and magnetic field minor control and relates to an electromagnetic field atomization diamond abrasive particle uniform jetting device and method. The device mainly comprises a workbench, supporting columns, a cylindrical permanent magnet, a receiving plate, diamond abrasive particles, an electrode ring, an annular permanent magnet, a fixing block, fastening screws, a nozzle body, a nozzle top cover, a connector, a pine electrode, an insulation sleeve, a liquid transferring guide pipe I, a metering pump, a liquid transferring guide pipe II, a stirrer, a liquid storage box, a high-voltage electrostatic generator and an electrode ring supporting rod. The two oppositely arranged permanent magnets and a pair of atomization electrodes are used, an electric field and a gradient magnetic field which are stable in intensity are formed in a diamond abrasive particle jetting zone, diamond abrasive particle drops move in the field line arrangement direction when jetted to the receiving plate, drifting of the drops can be reduced, and the jetting atomization angle can be increased, so that the diamond abrasive particles are distributed uniformly. A prepared abrasive wheel with the abrasive particles being distributed uniformly has the advantages of being high in machining surface quality, high in grinding efficiency and the like.

Description

technical field [0001] The invention belongs to the technical field of electrostatic atomization and magnetic field auxiliary control, and relates to a method for uniformly spraying diamond abrasive particles by electromagnetic field atomization. Background technique [0002] Conventional spraying methods have been widely used in pesticide spraying, material preparation, drying, dust removal and other aspects. The current spray method has a high deposition rate and a large coverage area. Under the condition of certain parameters such as flow rate and nozzle diameter, the atomization flow field can be adjusted to a certain extent by changing the spray pressure. However, conventional spraying methods have problems such as droplet drift and low atomization efficiency. The main reason is that the distribution of the flow field near the nozzle is not uniform, and the atomization conditions required by different types of liquids are also different. If the flow rate of the drople...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05B5/025B24D18/00
CPCB05B5/025B24D18/009
Inventor 陈逢军张磊尹韶辉梁火昌
Owner HUNAN UNIV
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