A kind of magnetron sputtering table and magnetron sputtering device

A magnetron sputtering and substrate technology, which is applied in sputtering coating, metal material coating process, vacuum evaporation coating and other directions, can solve the problems of low adjustment accuracy of the substrate to be formed and the mask plate, etc.
CN106756779BActive Publication Date: 2019-09-06BOE TECH GRP CO LTD

Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Patents(China)
Current Assignee / Owner
BOE TECH GRP CO LTD
Publication Date
2019-09-06

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The embodiment of the invention provides a magnetron sputtering machine and a magnetron sputtering device and relates to the technical field of magnetron sputtering processes. The problem that only by adjusting the number of spacers between a mask plate and a supporting frame for supporting the mask plate, the adjusting precision of the distance between a substrate to be subjected to film formation and the mask plate is relatively low can be avoided. The magnetron sputtering machine comprises the mask plate, a lifting mechanism and the substrate to be subjected to film formation. The substrate to be subjected to film formation is located on a bearing face of the lifting mechanism, and the mask plate is located on the side, back onto the lifting mechanism, of the substrate to be subjected to film formation. The lifting mechanism is used for ascending or descending according to lifting instructions so that the distance between the substrate to be subjected to film formation and the mask plate can be adjusted.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to the technical field of magnetron sputtering technology, in particular to a magnetron sputtering table and a magnetron sputtering device. Background technique

[0002] Organic Light Emitting Diode (English full name: Organic Light Emitting Diode, English abbreviation: OLED), as a current-type light-emitting device, is becoming more and more popular because of its characteristics such as self-luminescence, fast response, wide viewing angle and the ability to be fabricated on flexible substrates. It is increasingly used in the field of high-performance display.

[0003] For a large-sized OLED display, when the OLED device in the display is a top emission type, a transparent conductive material can be used as the cathode of the OLED device. The material constituting the transparent conductive layer may be IZO (English full name: Indium Zinc Oxide, Chinese full name: Indium Zinc Oxide) or IGZO (English full name: Indium Gallium Zin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More