Pixel limit layer, production method thereof, OLED substrate and production method thereof
A pixel-defining layer and substrate technology, applied in semiconductor/solid-state device manufacturing, printing, electrical components, etc., can solve the problems of cumbersome steps, expensive equipment, prone to delamination, etc., and achieve the effect of simplifying the preparation process and improving the production capacity
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[0030] This embodiment provides a method for preparing a pixel defining layer, which includes the following steps:
[0031] On the substrate, a first film layer is formed, and a grid-shaped second film layer is formed by inkjet printing, and the first film layer is located on the second film layer;
[0032] removing the first film layer corresponding to the hollowed-out position of the grid-like second film layer, and exposing the side of the second film layer at the hollowed-out position, so as to form a pattern including a pixel defining layer.
[0033] In the preparation method of the pixel defining layer in this embodiment, the grid-shaped second film layer under the first film layer is directly formed by inkjet printing, and the hollowing out of the grid-shaped second film layer is removed. The first film layer corresponding to the position is used to form the pixel defining layer, that is, the pattern of the pixel defining layer can be formed by only one patterning proce...
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