Display substrate mother board and its manufacturing method, ultraviolet light intensity monitoring method and equipment

Abstract

The invention provides a display substrate motherboard and preparation method thereof, ultraviolet light intensity monitoring method and device, and belongs to the technical field of displaying. At least one photosensitive transistor is arranged at the non-display area of the display substrate motherboard. After being subject to ultraviolet radiation, the TFT characteristic parameters of the photosensitive can change. Before the implementation of photo-alignment to the display substrate motherboard, the first TFT characteristic parameter of the photosensitive transistor is obtained. After the implementation of photo-alignment to the display substrate motherboard, before the change of the optical properties of the photosensitive transistor, the second characteristic parameter of the photosensitive transistor is obtained. The first TFT characteristic parameter is compared with the second TFT characteristic parameter to calculate the ultraviolet intensity in the photo-alignment process. The devices and methods can be used for monitoring the ultraviolet intensity in the photo-alignment process.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a display substrate motherboard and a manufacturing method thereof, a method and equipment for monitoring ultraviolet light intensity. Background technique [0002] In the manufacturing process of LCD (Liquid Crystal Display, liquid crystal display panel), it is necessary to arrange an alignment film on the color filter substrate and the array substrate, so that the liquid crystal molecules maintain a specific initial orientation without the action of an electric field. The manufacturing method of the alignment film includes rubbing alignment (Rubbing) and photo alignment (Photo Alignment). [0003] Among them, the photo-alignment method is to irradiate the alignment film on the display substrate with ultraviolet light passing through the polarizer, so that the surface of the alignment film has optical anisotropy. Compared with the traditional rubbing alignment method, the phot...

AI Technical Summary

Problems solved by technology

In the photo-alignment process, if the intensity of ultraviolet light is too low, the effective light energy received by the alignment film on the display substrate will be insufficient, resulting in abnormal alignment of the alignment film, disordered alignment of the liquid crystal, and poor alignment such as bright spots on the liquid crystal display panel. , therefore, it is necessary to monitor the UV light intensity during the photoalignment process

[0004] The existing ultraviolet light intensity monitoring method is to place a standard ultraviolet photodetector on the glass substrate and enter the optical alignment equipment when the optical alignment equipment is idle, to simulate the energy density of the ultraviolet light received by the substrate during the optical alignment process. However, the above method has the following disadvantages: the monitoring of the intensity of ultraviolet light takes up equipment production time, and when performing photoalignment on the film to be aligned on the display substrate, the standard ultraviolet photodetector cannot be placed in the photoalignment equipment, so it is impossible to monitor The UV light intensity during actual production may be different from the simulated results and the UV light intensity during actual production, and the abnormal UV light intensity caused by the fluctuation of alignment equipment in actual production cannot be detected

Images