Wafer processing technique for vertically integrating PLC waveguide with infrared receiver
A processing technology and receiver technology, applied in the coupling of optical waveguide, optical waveguide light guide, light guide, etc., can solve the problems of large volume of integrated module devices, inability to adapt to application requirements, and high processing cost, so as to achieve simple processing technology and avoid labor force The effect of low consumption and production cost
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[0036] Raw material: PLC wafer; The raw material is a PLC wafer (such as figure 1 shown in a); the thickness of the substrate is about 18 microns, the thickness of the cladding layer is about 19 microns, the width of the waveguide core is about 6 microns, and the thickness is about 6 microns. The PLC wafer has 16 output channels.
[0037] (1) Etch an inverted trapezoidal groove (such as figure 1 As shown in b), the depth of the groove is about 12 microns, the width of the bottom of the groove is about 30 microns, the length is about 120 microns, and the thickness of the remaining covering layer on the waveguide core layer is about 1 micron. The photolithography process includes laying photoresist, exposure and development to form a pattern, and then transfers the pattern to the cover layer by dry etching.
[0038] (2) Deposit a photosensitive layer (polycrystalline germanium) on the bottom of the inverted trapezoidal groove, with a thickness of about 0.6 microns, and the w...
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