Mask plate, substrate and display device

Abstract

The invention relates to the technical field of display device preparation and discloses a mask plate, a substrate and a display device. The mask plate is applied to display device preparation and comprises a panel, wherein a plurality of openings corresponding to pixel units on the display device in a one-to-one mode are formed in the panel, and every two adjacent edges in a corner of each opening are in smooth transition. When the mask plate is matched with a high-resolution exposure machine to perform picture composition, a pattern of the mask plate can be more clearly and accurately restored; furthermore, two adjacent edges at a corner of an opening area of the pattern are in smooth transition, so that electric charges are not prone to being gathered, and washing of residual charged particles is facilitated; thus, the display device prepared from the mask plate disclosed by the invention has an effect of improving residual images.

Description

technical field [0001] The invention relates to the technical field of display device preparation, in particular to a mask plate, a substrate and a display device. Background technique [0002] Such as figure 1 As shown, the opening design of the black matrix mask in the prior art has sharp chamfers ranging from 1-10 μm in the corners of the openings. It is relatively smooth, and with the improvement of the resolution of the exposure machine in the prior art, the corners of the exposed pattern are clear. The radius of curvature of the chamfer at the corner of the pattern opening exposed by the exposure machine is small, the structural gap is large, and the charges are easy to accumulate. Such corners are prone to residual charged particles, which makes it difficult to clean the glass produced by the high-resolution exposure machine. , which in turn will cause residual image defects in the display device thus produced. Contents of the invention [0003] The invention pro...

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Problems solved by technology

[0002] like figure 1 As shown, the opening design of the black matrix mask in the prior art has sharp chamfers ranging from 1-10 μm in the corners of the openings. It is relatively smooth, and with the improvement of the resolution of the exposure machine in the prior art, the corners of the exposed pattern are clear. The radius of curvature of the chamfer at the corner of the pattern opening exposed by the exposure machine is small, the structural gap is large, and the charges are easy to accumulate. Such corners are prone to residual charged particles, which makes it difficult to clean the glass produced by the high-resolution exposure machine. , which in turn will cause poor afterimages in the display device thus produced

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