Halftone mask plate

Abstract

The invention discloses a halftone mask plate. The halftone mask plate comprises an opening area and a shading area, wherein the opening area comprises a plurality of partially transparent first openings and a plurality of fully transparent second openings; the calibers of the first openings are not exactly the same, and the light transmittance of the first openings are also not exactly the same, so that the size dimensions of exposed diagrams of the first openings are equal, the exposed diagrams of the first openings are auxiliary cylinder-shaped spacers, and the exposed diagrams of the second openings are main cylinder-shaped spacers. According to the halftone mask plate, a thin film transistor liquid crystal display can be prevented from generating un-uniform brightness, and is convenient to use.

Description

technical field [0001] The invention relates to a halftone mask, belonging to the technical field of display panel preparation. Background technique [0002] In the TFT-LCD (thin film transistor liquid crystal display) process, PS (Post Spacer; column spacer) is a key process of the color filter (color filter) layer. Exposure is an important process in the PS process, and a mask is a basic tool for exposure. Since there are generally two PSs with different heights, Main PS (main PS) and SubPS (sub PS) on a small-sized Panel (glass substrate), if two mask exposures are used to make Main PS and Sub PS respectively, it will lead to PS process. The production capacity is reduced by half, and it will also double the loss of materials such as photoresist and developer. Therefore, it is very necessary to use a Mask exposure to make Main PS and Sub PS. This kind of Mask is usually called Halftone Mask (halftone mask). [0003] The Halftone Mask technology reduces the light transm...

AI Technical Summary

Problems solved by technology

For example, a thin layer of metal C is plated on the opening of the Sub PS r (Chromium), which can reduce the transmittance of the Sub PS opening, and lead to a decrease in the CD value of the pattern size after exposure and development in the area with low Sub PS transmittance

like figure 1 As shown, but because the existing part of the exposure machine adopts a special mirror group splicing design, therefore, Mura (brightness unevenness) will occur at the splicing part 11 between two adjacent mirror groups 1, which is usually called Lens Mura (lens brightness). uneven)

Thus, using the halftone mask 2 (such as figure 1 (shown) when exposed, the SubPS height of the corresponding Lens Mura area will be significantly lower than the Sub PS height of the normal area, and when further combined into a screen, the brightness of the Lens Mura area will be different from that of other areas, resulting in Mura on the TFT-LCD

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