Gasification supply device

Abstract

The present invention provides a gasification supply device capable of eliminating the inappropriate situation that the gas flow path leading from the gasifier to the flow control device is filled with liquid. The gasification supply device is provided with: a vaporizer (2), which heats the liquid (L) to vaporize it; a flow control device (3), which controls the flow rate of the gas sent from the vaporizer; a first control valve (5), which is intervened in the supply path (4) of the liquid to the vaporizer (2); the pressure detector (6), which is used to detect that it is vaporized in the vaporizer (2) and sent to the flow rate The pressure of the gas of the control device (3); the liquid detection part (7A), which measures the parameters of the liquid exceeding a predetermined amount in the vaporizer (2); and the control device (8), which is controlled as follows: The first control valve (5) can be controlled in such a way that a predetermined amount of liquid (L) is supplied to the vaporizer (2) according to the pressure value detected by the pressure detector (6), and the liquid is detected by the liquid detection part (7A). , close the first control valve (5).

Description

technical field [0001] The present invention relates to a vaporization supply device for vaporizing and supplying a liquid raw material used in semiconductor manufacturing equipment, chemical industry equipment, pharmaceutical industry equipment, and the like. Background technique [0002] Conventionally, for example, a liquid raw material vaporization supply device for supplying a raw material fluid to a semiconductor manufacturing apparatus using Metal Organic Chemical Vapor Deposition (MOCVD: Metal Organic Chemical Vapor Deposition) is used (eg, Patent Documents 1 to 4). [0003] For example Figure 8 As shown, this kind of liquid raw material gasification supply device first stores liquid raw material L such as TEOS (Tetraethylorthosilicate) in the liquid storage tank 100, supplies pressurized inert gas FG to the liquid storage tank 100, passes the inert gas The pressurization of FG pushes out the liquid raw material L in the liquid storage tank 100 at a constant pressur...

AI Technical Summary

Problems solved by technology

[0012] However, if the gas flow path from the gasifier to the flow control device is filled with liquid raw material due to some accidents, there will be a problem that the gas flow cannot be controlled by the flow control device and supplied.

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