A piezoresistive mems acceleration chip and manufacturing method thereof
An acceleration and piezoresistive technology, which is applied in the direction of acceleration measurement using inertial force, can solve the problems that the lateral sensitivity ratio cannot meet the application requirements, and the lateral output of the accelerometer is large, so as to avoid torsion and reduce the lateral output.
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specific Embodiment approach 1
[0041] Specific implementation mode 1: This implementation mode will be described in detail with reference to the accompanying drawings.
[0042] The present invention provides an acceleration chip with a double-sided fixed support structure, that is, the mass block is suspended on the fixed support frame through elastic beams connected to its upper surface and lower surface, such as Figure 4 shown. The working conditions of the double-sided fixed-supported structure are the same as those of the single-sided fixed-supported structure, such as Figure 5 shown.
[0043] Under the excitation of lateral acceleration, the moment of the mass block is balanced, and it moves in translation along the direction of acceleration without twisting. The elastic beam at one end of the mass is stretched and the other end is compressed. Due to the symmetrical structure, the tensile deformation and compressive deformation are equal in size, causing the resistance of the force-sensitive resis...
specific Embodiment approach 2
[0053] Specific embodiment two: the manufacturing method of a kind of piezoresistive MEMS acceleration chip described in the present embodiment, this method comprises:
[0054] Select N-type 100 monocrystalline silicon wafers with a resistivity of 2-6Ω·cm, clean and thermally oxidize the silicon wafers, and the oxidation thickness is 200nm; Figure 9 for silicon wafers, Figure 10 A silicon wafer after thermal oxidation;
[0055] The doping of the force sensitive resistor is completed by photolithography, RIE (reactive ion etching) and ion implantation; Figure 11 A chip doped for force sensitive resistors;
[0056] Use photolithography and etching to remove the oxide layer of the connection hole of the force sensitive resistor; Figure 12 shown;
[0057] Use magnetron sputtering or thermal evaporation to cover the metal layer on the force sensitive resistor;
[0058] Use photolithography, etching and alloying processes to pattern the metal layer into leads and electrodes, ...
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Abstract
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