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Laser-assisted heating chemical vapor deposition film coating device and method

A chemical vapor deposition, laser-assisted technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of low absorption coefficient, low heating efficiency, etc., achieve low deposition temperature, few inclusions, film The effect of high layer purity

Active Publication Date: 2018-04-06
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Of course, glass also has certain absorption for other wavelengths of laser light. For example, laser light of about 1 μm can also be used to heat glass. However, due to its low absorption coefficient, different types of glass have different absorption coefficients, and laser light passes through glass , form bulk absorption, low heating efficiency

Method used

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  • Laser-assisted heating chemical vapor deposition film coating device and method
  • Laser-assisted heating chemical vapor deposition film coating device and method
  • Laser-assisted heating chemical vapor deposition film coating device and method

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Effect test

Embodiment

[0037] The laser-assisted heating chemical vapor deposition coating method of this embodiment includes the following steps:

[0038] Preheating step S1, using a heating device to preheat the glass substrate;

[0039] In the local heating step S2, the infrared laser is used to generate a linear spot to locally heat the preheated glass substrate, thereby assisting the chemical vapor deposition reaction coating.

[0040] Among them, in the process of local heating of the glass substrate by the infrared laser, a vibrating mirror is used to change the path of the laser beam; the length of the linear spot is 0.5-110mm, and the width is 0.2-0.5mm; and the power density distribution of the linear spot satisfies

[0041] h×A×ρ×C×Δt=E / η=P×t

[0042] Among them, h represents the heating depth, A represents the heating area, ρ represents the density of the glass substrate, C represents the specific heat of the glass substrate, Δt represents the temperature rise, E represents the laser he...

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Abstract

The invention discloses a laser-assisted heating chemical vapor deposition film coating device and method and belongs to the technical field of film coating. The laser-assisted heating chemical vapordeposition film coating device comprises a fume hood, a sliding preheating system penetrating through one side of the fume hood and used for carrying a glass substrate, a laser heating system penetrating through the other side of the fume hood and a control system in communication connection with the sliding preheating system and the laser heating system. The laser heating system is located abovethe sliding preheating system. The laser heating system comprises an infrared CO2 laser and a beam shaping device used for changing the path of a laser beam. The laser-assisted heating chemical vapordeposition film coating device generates a line-type light spot through infrared laser and conducts local secondary heating on the line-type light spot. Due to the character of the high-energy density, the laser is acted on the substrate to conduct rapid heating and assist in chemical vapor deposition reaction film coating. The laser-assisted heating chemical vapor deposition film coating device is easy to control, high in temperature regulation precision and more beneficial to improving the film coating quality.

Description

technical field [0001] The invention relates to the technical field of coating, in particular to a laser-assisted heating chemical vapor deposition coating device and method. Background technique [0002] The chemical vapor deposition (CVD) method is an important thin film preparation method, which uses gaseous precursor reactants to form solid thin films through chemical reactions between atoms and molecules. The advantages of this method include fast film forming speed, high adhesion strength, controllable composition and easy doping, complete crystallization with high purity, simple device and low cost. [0003] When the traditional CVD method is used to deposit thin films, a chemical reaction needs to occur on the surface of the substrate to form a film. Almost all deposition reactions are endothermic reactions, so it is necessary to use a heat source to heat the substrate to a certain temperature before it can be realized. However, there will be problems such as There ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/46C23C16/52
CPCC23C16/46C23C16/52
Inventor 刘涌韩高荣马晔城林威豪宋晨路汪建勋
Owner ZHEJIANG UNIV
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