Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method and device for obtaining parasitic mismatch capacitance of mems accelerometer

An accelerometer and acceleration technology, which is applied in the direction of measuring acceleration, testing/calibration of speed/acceleration/shock measurement equipment, speed/acceleration/shock measurement, etc., can solve the problem of low measurement accuracy and achieve high precision and reliable accuracy Effect

Active Publication Date: 2020-04-03
CHINA ELECTRONICS PROD RELIABILITY & ENVIRONMENTAL TESTING RES INST
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Based on the above analysis, it is necessary to provide a method for obtaining the parasitic mismatch capacitance of the MEMS accelerometer and a method for obtaining the parasitic mismatch capacitance of the MEMS accelerometer in view of the problem of low measurement accuracy in the traditional method of obtaining the parasitic mismatch capacitance. device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for obtaining parasitic mismatch capacitance of mems accelerometer
  • Method and device for obtaining parasitic mismatch capacitance of mems accelerometer
  • Method and device for obtaining parasitic mismatch capacitance of mems accelerometer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The specific implementations of the method and device for obtaining the parasitic mismatch capacitance of a MEMS accelerometer of the present invention will be described in detail below with reference to the accompanying drawings. The preferred embodiment of the invention is shown in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thorough and comprehensive.

[0025] With the development of aerospace, intelligent applications, and military systems, the demand for high-precision, high-stability and high-performance MEMS accelerometers has also increased; MEMS accelerometers have the following significant advantages over traditional accelerometers: Small size, light weight, low power consumption, easy integration, strong anti-overload capability and mass production....

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for acquiring the parasitic mismatch capacitance of an MEMS accelerometer, including the following steps: acquiring at least two preload voltages of an MEMS accelerometer during normal work and corresponding output voltages; acquiring fitting parameters according to the structure parameters, the preload voltages and the output voltages of the MEMS accelerometer; acquiring the bending amount of the mechanical beam of the MEMS accelerometer according to the structure parameters and the fitting parameters; and acquiring the parasitic mismatch capacitance of the MEMS accelerometer according to the structure parameters and the bending amount of the mechanical beam. The invention further discloses a device for acquiring the parasitic mismatch capacitance of an MEMS accelerometer. Through the process, the parasitic mismatch capacitance of the MEMS accelerometer during work is obtained. The problem that the traditional method for acquiring the parasitic mismatch capacitance has low measurement precision is solved. An effect of precise and reliable acquisition of the parasitic mismatch capacitance is achieved.

Description

Technical field [0001] The present invention relates to the technical field of accelerometer measurement, in particular to a method and device for obtaining the parasitic mismatch capacitance of a MEMS accelerometer. Background technique [0002] As a key sensitive component in inertial measurement and control systems, accelerometers have important applications in military, industrial, medical, security monitoring and consumer electronics fields, especially with the expansion of application fields and MEMS (Micro Electro Mechanical System) technology The development of MEMS accelerometers has become a research hotspot. Compared with traditional accelerometers, MEMS accelerometers have significant advantages: small size, light weight, low power consumption, easy integration, strong anti-overload capability, and mass production. With the development of aerospace, intelligent applications, and military systems, the demand for high-precision, high-stability, and high-performance MEM...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01P21/00G01P15/125
CPCG01P15/125G01P21/00
Inventor 董显山黄钦文朱军华恩云飞
Owner CHINA ELECTRONICS PROD RELIABILITY & ENVIRONMENTAL TESTING RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com