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Mask, fabrication method thereof, display panel and fabrication method of display panel

A display panel and reticle technology, which is applied to the photolithographic process of the patterned surface, instruments, and originals for photomechanical processing, etc., can solve the problem of resource waste in the reticle, achieve resource saving, enhance versatility, The effect of reducing the area

Active Publication Date: 2018-06-15
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of this, the present invention provides a reticle and its preparation method, a display panel and its preparation method, and the main technical problem to be solved is the serious waste of resources when making a reticle in the prior art

Method used

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  • Mask, fabrication method thereof, display panel and fabrication method of display panel
  • Mask, fabrication method thereof, display panel and fabrication method of display panel
  • Mask, fabrication method thereof, display panel and fabrication method of display panel

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preparation example Construction

[0078] Based on the above embodiments, the embodiments of the present invention further provide a method for preparing a mask, referring to Figure 13 As shown, the method includes:

[0079] 101 . Etching the first connection region 11 on the standard mask to obtain the basic mold unit 1 .

[0080] The basic mold unit 1 has the same shape as the standard reticle, so the basic mold unit 1 can be formed by modifying the standard reticle. Moreover, the basic mold unit 1 is made by using a standard mask, and the precision of the basic mold unit 1 can be kept consistent with that of the standard mask, so that its precision is far greater than that of an integrally formed special-shaped mask. The first connection region 11 on the standard mask is etched to obtain at least one region that can be connected to the connection member 2 . Specifically, an etching process can be used to perform photolithographic etching on the position where the first connection region 11 needs to be ope...

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Abstract

The invention discloses a mask, a fabrication method thereof, a display panel and a fabrication method of the display panel, and relates to the technical field of die fabrication. The problems of serious resource waste during mask fabrication of the prior art can be solved. The mask comprises a foundational die unit and at least one connection member, wherein the foundational die unit comprises afirst connection region, the connection member which is laminated comprises a second connection region and a non-connection region, the foundational die unit and the connection member are connected bythe first connection region and the second connection region, and the appearance of the non-connection region and the appearance of the foundational die unit form a target shape required by the mask.The mask is generally used for fabricating a regularly-shaped display panel and an irregularly-shaped display panel.

Description

technical field [0001] The invention relates to the technical field of mold making, in particular to a mask plate and a preparation method thereof, a display panel and a preparation method thereof. Background technique [0002] With the development of technology and trends, the display panels of various electronic devices are also undergoing rapid changes. In order to meet different needs and aesthetics, equipment manufacturers will design different appearances for a display panel of one size, and produce products with different Shaped display panel. An important process in manufacturing a display panel is to deposit a film on the substrate of the display panel by evaporating, wherein it is necessary to use a mask to block the position where the film is not needed to determine the position of the film. [0003] Due to the different shapes of the display panels, the positions of the corresponding covering films on the substrates are also different, and the shapes of the appl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/64
CPCG03F1/64C23C14/042C23C14/24
Inventor 徐鹏吴建鹏
Owner BOE TECH GRP CO LTD