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X-ray zone plate manufacturing system

A preparation system and zone plate technology, which is applied in the field of X-ray zone plate preparation system, can solve the problems such as the inability to realize the growth of materials on filamentous substrates, shorten the process purging time, realize unidirectional flow, and conduct heat good sex effect

Active Publication Date: 2018-07-20
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This traditional ALD equipment chamber can only heat sheet-like substrates. When the target substrate is in the shape of filaments, this ALD equip

Method used

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  • X-ray zone plate manufacturing system
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Embodiment Construction

[0024] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0025] Such as figure 1 As shown, the embodiment of the present invention provides an X-ray zone plate preparation system, and the system includes: a chamber 3; a first precursor inlet pipeline 1, and the first precursor inlet pipeline 1 is connected to the chamber One end of the chamber 3 is communicated for delivering the first precursor i...

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Abstract

The invention relates to an X-ray zone plate manufacturing system. The X-ray zone plate manufacturing system comprises a chamber, a first precursor charging pipeline, a second precursor charging pipeline, a clamp, a muffle furnace, an air sucking pipeline and a vacuum pump, wherein the first precursor charging pipeline communicates with one end of the chamber and is used for conveying a first precursor into the chamber; the second precursor charging pipeline communicates with one end of the chamber and is used for conveying a second precursor into the chamber; the clamp is arranged inside thechamber and is used for fixing columnar thin-filament-shaped linings; the chamber is coated with the muffle furnace; the muffle furnace is used for heating the chamber; one end of the air sucking pipeline communicates with the other end of the chamber; and the vacuum pump is connected with the other end of the air sucking pipeline and is used for vacuumizing the chamber via the air sucking pipeline. The X-ray zone plate manufacturing system provided by the invention can realize simultaneous alternating growing of two types of zone plates on a plurality of columnar thin-filament-shaped liningsand improves the machining efficiency of the zone plates.

Description

technical field [0001] The invention relates to the technical field of atomic layer deposition, in particular to an X-ray zone plate preparation system. Background technique [0002] Atomic layer deposition (ALD) is a thin film preparation technology that can achieve monoatomic layer growth. Its self-limitation and complementarity enable this technology to have excellent control over the composition and thickness of the film, and the prepared thin film has good shape retention. , high purity and uniformity, has been widely used in various fields. [0003] At present, the preparation of X-ray zone plates by atomic layer deposition technology is an effective method to improve the resolution and diffraction efficiency of X-ray zone plates. X-ray zone plate is an optical element in the X-ray band, which has the functions of dispersion, focusing and imaging of X-rays. The traditional preparation methods mainly include laser holography, electron beam lithography, sputtering secti...

Claims

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Application Information

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IPC IPC(8): C23C16/455C23C16/458
CPCC23C16/45544C23C16/4581
Inventor 王胜涛卢维尔夏洋
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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