Unlock instant, AI-driven research and patent intelligence for your innovation.

Mask plate, exposure device and production method of mask plate

A mask plate and equipment technology, applied in the field of exposure, can solve the problem of mask plate bending and other problems, and achieve the effect of solving the problem of bending

Pending Publication Date: 2018-07-27
BOE TECH GRP CO LTD +1
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The object of the present invention is to provide a mask plate, exposure equipment and a mask plate manufacturing method, which can adjust the flatness of the mask plate and solve the problem of the mask plate being bent due to gravity in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate, exposure device and production method of mask plate
  • Mask plate, exposure device and production method of mask plate
  • Mask plate, exposure device and production method of mask plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the following will clearly and completely describe the technical solutions of the embodiments of the present invention in conjunction with the drawings of the embodiments of the present invention. Apparently, the described embodiments are some, not all, embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the described embodiments of the present invention belong to the protection scope of the present invention.

[0043] Such as Figure 1 to Figure 2 As shown, the mask provided by the embodiment of the present invention includes a mask body 100, and the mask body 100 includes a light-shielding area 101 and a light-transmitting area 102, and a magnetic layer 200 is disposed on the mask body 100. The orthographic projection of the magnetic layer 200 on the mask body 100 is a light-transmitting structu...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a mask plate, an exposure device and a production method of the mask plate. The mask plate comprises a mask plate body, wherein the mask plate body comprises a light shading area and a light transmitting area, the mask plate body is provided with a magnetic layer, and a front projection of the magnetic layer on the mask plate body is a light transmitting structure in an areawhere the light transmitting area is located. By adopting the mask plate, the exposure device and the production method of the mask plate provided by the invention, the flatness of the mask plate canbe adjusted, and the problem in the prior art that the mask plate is curved due to the gravity can be solved.

Description

technical field [0001] The invention relates to the field of exposure technology, in particular to a mask plate, exposure equipment and a manufacturing method of the mask plate. Background technique [0002] The exposure machine is the core equipment for forming the film layer pattern. Taking the proximity exposure machine as an example, during exposure, a glass substrate with photoresist is placed above the working base in the exposure chamber, and a mask is placed on it, and the mask has an opaque area. When the ultraviolet light passes through the mask, part of the light is blocked by the opaque area on the mask, and the other part of the light passes through the mask and irradiates the photoresist, so that the photoresist undergoes photocrosslinking or photodecomposition reaction, Thereby forming the desired pattern after development. During the exposure process, the mask plate will bend when it is placed horizontally due to its own gravity, causing the exposure patter...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F1/38
CPCG03F1/38
Inventor 赵立星韩旭王胜广
Owner BOE TECH GRP CO LTD