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Polygon-based geometric classification for semiconductor mask inspection

A polygon and mask technology, applied in the field of photomask inspection, can solve existing problems and other problems

Active Publication Date: 2019-12-17
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, even though these rasterized images have a higher resolution than optical images, defect classification using such rasterized database images is problematic due to the limited resolution of such rasterized database images

Method used

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  • Polygon-based geometric classification for semiconductor mask inspection
  • Polygon-based geometric classification for semiconductor mask inspection
  • Polygon-based geometric classification for semiconductor mask inspection

Examples

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[0028] In general, certain embodiments of the present invention use processed DB polygons for feature classification for use in defect detection. figure 1 is a flowchart illustrating a database (DB) feature classification process 100 according to one embodiment of the present invention. Initially, a design database having a plurality of polygons with vertices is obtained in operation 102 . Input data for a particular DB verification method may include patterns designed by electronic design automation (EDA) software. Those design patterns are represented geometrically as polygons, and as trapezoids or rectangles on a two-dimensional plane, each having three or four vertices. In general, a design DB may contain complex shapes formed from more basic shapes such as rectangles or squares. like Figure 2A As shown in , a portion of database 200 contains a plurality of simple polygons, eg, rectangular polygons 202a through 202g. By way of example, polygon 202a includes vertices ...

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Abstract

Methods and apparatus for providing feature classification for inspection of photolithographic masks are disclosed. The design database used to make the mask contains polygons each defined by a set of vertices. Any of the polygons that are adjacent to each other are grouped together. Any grouped polygons are collapsed so as to eliminate the interior edges of each grouped polygon to obtain a polygon corresponding to the coverage area of ​​the grouped polygon. A plurality of feature classes in the polygons of the design database are provided and detected using geometric constraints specifying requirements for detecting the plurality of feature classes. Defects in the mask are detected using the detected feature classes.

Description

[0001] Related Application Cross Reference [0002] This application claims the benefit of the following prior applications: (i) YinXu et al., filed August 10, 2015, entitled "Polygon-Based Geometric Classification for Semiconductor Mask Inspection (POLYGON- BASEDGEOMETRY CLASSIFICATION FOR SEMICONDUCTOR MASK INSPECTION), U.S. Provisional Application No. 62 / 203,281, which is hereby incorporated by reference in its entirety for all purposes. technical field [0003] The present invention relates generally to the field of photomask inspection. More particularly, the invention relates to geometric classification of features for defect detection during inspection. Background technique [0004] The semiconductor manufacturing industry involves highly complex techniques for integrating circuits into semiconductor materials. One of the techniques includes photolithography, which involves transferring a pattern from a photomask or reticle to a photoresist layer using a combinatio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F1/26H01L21/033H01L21/66
CPCG06T2207/30148G06T7/0006G03F1/26G03F7/7065G03F7/70791H01L21/0337H01L22/12
Inventor 徐寅顾文斐(亚历克斯)石瑞芳
Owner KLA CORP