Ozone gas heating mechanism, substrate processing device, and substrate processing method
A substrate processing device and gas heating technology, applied in electrical components, semiconductor/solid-state device manufacturing, discharge tubes, etc., can solve problems such as the influence of oxide film characteristics, and achieve the effect of reducing the deviation of substrate temperature
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[0019] Hereinafter, modes for implementing the present invention will be described with reference to the drawings. In addition, in this specification and drawings, the same code|symbol is attached|subjected to the structure which is substantially the same, and repeated description is abbreviate|omitted.
[0020] A substrate processing apparatus according to an embodiment of the present invention will be described. figure 1 It is a schematic cross-sectional view of the substrate processing apparatus according to the embodiment of the present invention.
[0021] Such as figure 1 As shown, the substrate processing apparatus 1 has a substantially cylindrical processing container 4 whose longitudinal direction is in the vertical direction. The processing container 4 has a double pipe structure including an outer cylinder 6 having a top and an inner cylinder 8 arranged concentrically with the outer cylinder 6 inside the outer cylinder 6 and having a top. The lower end of the in...
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