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Wafer and MASK independent picking and placing and precise positioning mechanism

A precise positioning and wafer technology, applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of low positioning accuracy and difficulty in continuous production, and achieve the effect of improving production efficiency and saving costs

Pending Publication Date: 2018-08-10
成都华聚科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing positioning mechanism has the technical problems of low positioning accuracy and difficulty in continuous production

Method used

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  • Wafer and MASK independent picking and placing and precise positioning mechanism
  • Wafer and MASK independent picking and placing and precise positioning mechanism
  • Wafer and MASK independent picking and placing and precise positioning mechanism

Examples

Experimental program
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Embodiment Construction

[0017] The present invention will be further described below in conjunction with accompanying drawing:

[0018] Such as Figure 1-Figure 6 As shown, a wafer and MASK separate pick-and-place and precise positioning mechanism, including a lifting shaft 1 that lifts in the vertical direction, a wafer carrier 8 for containing wafers, a MASK (mask plate) 7, and a fixed setting And it is used to support the wafer carrier 8 and the positioning carrier plate 4 of the MASK7. The top of the lifting shaft 1 is provided with a connecting plate 2 extending in the horizontal direction, and the top of the connecting plate 2 is provided with at least three support rods arranged in the vertical direction. 3. Each support rod 3 is provided with a first support 5 for supporting the wafer carrier 8 and a second support 6 above the first support 5 for supporting the MASK7, the wafer The round carrier 8 is horizontally supported by the first support 5, and the MASK7 is horizontally supported by th...

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PUM

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Abstract

The invention discloses a wafer and MASK independent picking and placing and precise positioning mechanism. The mechanism comprises a lifting shaft lifting in the vertical direction, a wafer carrier,a MASK and a positioning bearing disc. At least three supporting rods are arranged on the top of the lifting shaft. Each supporting rod is provided with a first supporting part for supporting the wafer carrier, and a second supporting part located above the first supporting part and used for supporting the MASK. First avoiding openings allowing the supporting rods, the first supporting parts and the second supporting parts to penetrate through the positioning bearing disc in the vertical direction are formed in the positioning bearing disc, and second avoiding openings allowing the second supporting parts to penetrate through the wafer carrier in the vertical direction are further formed in the wafer carrier. The mechanism has the advantages that the problem about wafer and MASK precise positioning in the vacuum environment is solved, a double-layer lifting device is creatively designed, and wafer and MASK independent picking and placing are achieved.

Description

technical field [0001] The invention relates to the technical field of wafer processing, in particular to a wafer and MASK separate pick-and-place and precise positioning mechanism. Background technique [0002] In semiconductor PVD and CVD processes, it is often necessary to place MASKs (masks) of different shapes above the wafer in a vacuum environment, and deposit specific functional films on the surface of the wafer through specific patterns on the MASK. In order to ensure the precision of the film, precise positioning of the wafer and the MASK must be required. However, the existing positioning mechanism has the technical problems of low positioning accuracy and difficulty in continuous production. Contents of the invention [0003] The purpose of the present invention is to overcome the shortcomings of the prior art, and to provide a wafer and MASK separate pick-and-place and precise positioning mechanism, which can realize the separate pick-and-place and precise po...

Claims

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Application Information

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IPC IPC(8): H01L21/68H01L21/687
CPCH01L21/681H01L21/682H01L21/68714H01L21/68742
Inventor 潘明元陈新
Owner 成都华聚科技有限公司