A Preprocessing Method Before Optical Proximity Correction

Abstract

The invention provides a preprocessing method before optical proximity correction, which belongs to the technical field of microelectronics optical proximity correction, comprising: inputting the original target figure into the preprocessing software; expanding the first short side and the first adjacent side to form the second A rectangle, expand the second short side and the second adjacent side to form the second rectangle in the orthogonal direction; select the third adjacent side by preprocessing software, and extend the third adjacent side to both ends for a predetermined length and then expand the third Adjacent sides form a third rectangle; the first rectangle and the second rectangle are logically summed to obtain the first figure, and the first figure and the third rectangle are logically negated to obtain the first polygon; the original object The graphics and the first polygon are merged to obtain the processed target graphics. The beneficial effect of the present invention is that the graphic gap on the hypotenuse can be filled in a targeted manner, thereby removing factors that are not conducive to optical proximity correction, and making the OPC result better meet expectations.

Description

technical field [0001] The invention relates to the technical field of microelectronic optical proximity correction, in particular to a preprocessing method before optical proximity correction. Background technique [0002] With the continuous development of integrated circuit technology, model-based OPC (Optical ProximityCorrection, short for Optical Proximity Correction) has been widely used in the key-level mask manufacturing process. Model-based OPC can simulate well according to the established model. In the imaging on the silicon wafer after exposure, by compensating the reticle pattern, the pattern on the silicon wafer can be consistent with the design or target pattern, and the pattern distortion caused by the optical proximity effect can be solved. [0003] Model-based OPC will cut the target graphic into segments according to the rules, and set measurement points on the segments, and make corrections while simulating, and finally make the simulation results consist...

AI Technical Summary

Problems solved by technology

Since the conventional graphic side is orthogonal to the coordinate axis, the above method can effectively deal with the graphic protrusion or the graphic gap. However, for the graphic protrusion or graphic gap on the hypotenuse, it is impossible to directly form the graphic filling area including the short side and its adjacent side. , so the above method cannot be used to deal with

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