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Overlay measuring device matched with four clamping blocks and used for preventing light scattering based on deformation

A measuring device and deformation technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as affecting efficiency, overlay error, scattering, etc., and achieve the effect of improving efficiency and preventing light source scattering

Active Publication Date: 2019-02-12
唐山市鑫瑞土地利用咨询有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies in the prior art, the purpose of the present invention is to provide an overlay measuring device based on deformation preventing light scattering and matching four-sided clamping blocks, so as to solve the problem that there is no real object that can be used as a reference when loading materials and cover boards. Deviations are prone to occur, and due to the small vibration during laser engraving, there will be a slight misalignment between the material and the cover plate, causing overlay errors, and the brightness of the environment when the light source propagates will cause it to scatter and affect the efficiency.

Method used

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  • Overlay measuring device matched with four clamping blocks and used for preventing light scattering based on deformation
  • Overlay measuring device matched with four clamping blocks and used for preventing light scattering based on deformation
  • Overlay measuring device matched with four clamping blocks and used for preventing light scattering based on deformation

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Embodiment Construction

[0026] In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific embodiments.

[0027] see figure 1 , the present invention provides a technical scheme of an overlay measuring device based on deformation prevention of light scattering and four-sided clamping block: its structure includes an adjustment vertical rod 1, a rotator 2, a photolithography probe 3, a storage seat 4, a base 5, and a support rod 6 , the bottom of the adjustment vertical bar 1 is fixedly connected to the rear end of the base 5, the bottom of the adjustment vertical bar 1 is perpendicular to the top of the base 5, the bottom of the storage seat 4 is fixedly connected to the top of the base 5, the bottom of the base 5 is connected to the support bar The top of 6 is threaded, the top of the support rod 6 is vertically connected to the bottom of the base 5...

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Abstract

The invention discloses an overlay measuring device matched with four clamping blocks and used for preventing light scattering based on deformation. The device structurally comprises an adjusting vertical rod, a rotator, a photoetching probe, a storage seat, a base and supporting rods; a fixed rotating rod and a threaded seat are provided with threaded grooves, and are matched with each other forfixing a stable light gathering device; a positioning block tightly presses a material plate and a sleeve plate, and a fixed upwarped plate and a pressing block are combined stably, so that the tightly pressed material plate and sleeve plate are prevented from being dislocated due to vibration during photoetching and overlay, and an overlay error is reduced; four retaining rings are fastened around the photoetching probe in a mutually matched mode; and meanwhile, deformed plates are attached to each other and are matched with a supporting plate to form a small space, so that when the photoetching probe is in an engraving state, a light source is prevented from being scattered, and the efficiency is improved.

Description

technical field [0001] The invention relates to an overlay measuring device based on deformation preventing light scattering and four-sided clamping blocks, belonging to the field of photolithography overlay devices. Background technique [0002] There are many kinds of engraving techniques. Among them, photolithography engraving uses laser and cover plate to engrave materials, but when loading materials and cover plates, deviations are prone to occur, and because of laser engraving, there will still be small vibrations, which will make the material There is a slight misalignment with the set board, and the brightness of the environment when the light source spreads will cause it to scatter, which will affect the efficiency. [0003] However, the existing overlay measuring device has the following disadvantages: [0004] When loading materials and sets, since there is no physical object that can be used as a reference, deviations are prone to occur, and because there will s...

Claims

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Application Information

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IPC IPC(8): G01B11/00
CPCG01B11/00
Inventor 李志护
Owner 唐山市鑫瑞土地利用咨询有限公司
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