Process equipment maintenance method and system and process equipment maintenance control device

A technology for process equipment and equipment maintenance, which is applied in the direction of optical testing defects/defects, etc., can solve problems such as long equipment maintenance time and inaccurate test results, and achieve the effects of prolonging equipment running time, accurate test results, and improving yield

Active Publication Date: 2019-02-19
德运创鑫(北京)科技有限公司
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  • Application Information

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Problems solved by technology

[0004] Based on this, it is necessary to provide a process equipment maintenance method, system and process equipment maintenance c

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  • Process equipment maintenance method and system and process equipment maintenance control device
  • Process equipment maintenance method and system and process equipment maintenance control device
  • Process equipment maintenance method and system and process equipment maintenance control device

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Embodiment Construction

[0055] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0056] see figure 1 , In one embodiment of the present application, a process equipment maintenance method is provided, which is used to detect the amount of light transmitted through an equipment observation window in the equipment. The process equipment maintenance methods include:

[0057] S100. The controller obtains a value of luminous flux passing through the observation window of the device, wherein the value of the luminous flux is obtained by a sensor disposed outside the device and directly opposite to the observation window of the device.

[0058] In this step...

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Abstract

The application provides a process equipment maintenance method and system and a process equipment maintenance control device. The process equipment maintenance method comprises the steps of: a controller acquiring a value of the luminous flux that passes through a viewing window of the equipment, wherein the value of the luminous flux is obtained by a sensor disposed outside the equipment and directly opposite to the viewing window of the equipment; and if the value of luminous flux is less than a maintenance threshold of the luminous flux equipment, the controller issuing a control instruction that the viewing window of the equipment needs to be cleaned. The value of the luminous flux of the viewing window of the equipment can be obtained in real time by applying the process equipment maintenance method of the application to a vacuum coating apparatus, and whether the viewing window of the equipment needs to be cleaned is monitored by the decrease of the luminous flux of the viewingwindow of the equipment, so the detection result is more accurate, thereby effectively avoiding the vacuum breaking detection of vacuum chamber, improving the yield of products produced by the processequipment, and prolonging the running time of the equipment.

Description

technical field [0001] The application relates to the technical field of industrial production process detection, in particular to a process equipment maintenance method, system and process equipment maintenance control device. Background technique [0002] With the rapid development of the economy and the continuous advancement of the level of industrialization, the equipment used in industrial production is moving towards the direction of large-scale, complex, precise and intelligent. In view of the phenomenon of equipment observation window contamination in vacuum coating equipment, the traditional method is to determine whether the equipment observation window has been polluted by detecting whether the substrate exists in the vacuum chamber. Once the observation window of the equipment is polluted, the existence and position information of the substrate in the vacuum chamber will not be detected, resulting in the failure of the entire substrate conveying system, and even...

Claims

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Application Information

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IPC IPC(8): G01N21/94
CPCG01N21/94
Inventor 张文
Owner 德运创鑫(北京)科技有限公司
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