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Process equipment maintenance method, system and process equipment maintenance control device

A technology for process equipment and equipment maintenance, which is applied in the direction of optical testing flaws/defects, etc., can solve problems such as inaccurate test results and long equipment maintenance time, achieve accurate test results, extend equipment running time, and improve yield.

Active Publication Date: 2021-10-15
德运创鑫(北京)科技有限公司
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  • Claims
  • Application Information

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Problems solved by technology

[0004] Based on this, it is necessary to provide a process equipment maintenance method, system and process equipment maintenance control device for the problems of inaccurate detection results and long equipment maintenance time of traditional detection methods

Method used

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  • Process equipment maintenance method, system and process equipment maintenance control device
  • Process equipment maintenance method, system and process equipment maintenance control device
  • Process equipment maintenance method, system and process equipment maintenance control device

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Embodiment Construction

[0055] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0056] see figure 1 , In one embodiment of the present application, a process equipment maintenance method is provided, which is used to detect the amount of light transmitted through an equipment observation window in the equipment. The process equipment maintenance methods include:

[0057] S100. The controller obtains a value of luminous flux passing through the observation window of the device, wherein the value of the luminous flux is obtained by a sensor disposed outside the device and directly opposite to the observation window of the device.

[0058] In this step...

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Abstract

The present application provides a process equipment maintenance method, system and process equipment maintenance control device. The process equipment maintenance method includes that the controller obtains the value of the luminous flux passing through the equipment observation window. The luminous flux value is acquired by a sensor arranged outside the device and directly facing the observation window of the device. If the luminous flux value is less than the luminous flux equipment maintenance threshold, the controller sends a control instruction that the equipment observation window is to be cleaned. The process equipment maintenance method of the present application is applied in vacuum coating equipment, and the luminous flux value of the observation window of the equipment can be obtained in real time, and whether the observation window of the equipment needs to be cleaned is monitored through the decrease of the luminous flux of the observation window of the equipment. The detection result is more accurate, thereby effectively avoiding the detection of vacuum chamber breakage, improving the yield rate of products in the process equipment, and prolonging the operation time of the equipment.

Description

technical field [0001] The application relates to the technical field of industrial production process detection, in particular to a process equipment maintenance method, system and process equipment maintenance control device. Background technique [0002] With the rapid development of the economy and the continuous advancement of the level of industrialization, the equipment used in industrial production is moving towards the direction of large-scale, complex, precise and intelligent. In view of the phenomenon of equipment observation window contamination in vacuum coating equipment, the traditional method is to determine whether the equipment observation window has been polluted by detecting whether the substrate exists in the vacuum chamber. Once the observation window of the equipment is polluted, the existence and position information of the substrate in the vacuum chamber will not be detected, resulting in the failure of the entire substrate conveying system, and even...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/94
CPCG01N21/94
Inventor 张文
Owner 德运创鑫(北京)科技有限公司
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