Two-degree-of-freedom micro-nano positioning platform

A technology of micro-nano positioning and degrees of freedom, applied in the parts and instruments of the instrument, can solve the problems of force-displacement nonlinear effect, high concentrated stress of hinges, strict installation space requirements of positioning platform, etc. Linear, reducing the stress concentration of the hinge, without the effect of assembly

Active Publication Date: 2019-03-19
HANGZHOU DIANZI UNIV
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AI Technical Summary

Problems solved by technology

[0003] In some occasions that require a large working stroke, a displacement amplification mechanism is usually designed and installed in the micro-nano positioning platform to amplify the output displacement of the driver, but at the same time the size of the positioning platform is increased, and some applications h

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  • Two-degree-of-freedom micro-nano positioning platform
  • Two-degree-of-freedom micro-nano positioning platform

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[0023] Specific implementation plan

[0024] The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] In the multi-degree-of-freedom micro-nano positioning platform, the effective decoupling mechanism has the functions of reducing control difficulty, improving positioning accuracy and avoiding damage to the driver; therefore, an effective decoupling mechanism, large positioning stroke, small hinge concentration stress, The positioning platform structure with good force-displacement linearity and compactness is of great significance to improving the performance of the positioning system.

[0026] A two-degree-of-freedom micro-nano positioning platform, comprising a base 1, a movement platform 2, a guide mechanism 4, a decoupling mechanism 5, and a driver 6. The middle of the base 1 is provided with a movement platform 2 which passes around the movement platform 2 The decoupling 5 mechanism is connecte...

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Abstract

The invention discloses a two-degree-of-freedom micro-nano positioning platform. The two-degree-of-freedom micro-nano positioning platform comprises a base, a motion platform, guide mechanisms, decoupling mechanisms and drivers. The motion platform is arranged in the middle portion of the base. The four sides of the motion platform are connected with the motion mechanism. The guide mechanisms areconnected with the decoupling mechanisms. The decoupling mechanisms are connected with the base. An amplifying mechanism is arranged between the motion platform and each decoupling mechanism and connected with the decoupling mechanism. The drivers are arranged in the corresponding amplifying mechanisms. The drivers are used for driving the motion platform. The space of the positioning platform iseffectively utilized through the structural layout. The overall size of the positioning platform is reduced. Force-displacement nonlinearity generated from the hinge rigidity effect of the positioningplatform and concentrated stress of hinges can be reduced. Through a driver auxiliary assembly mechanism, the drivers are more conveniently assembled into the amplifying mechanisms in an interferencemode. The positioning platform can conduct wire cutting integrated machining and has the advantages of being free of assembly, friction and lubrication and the like.

Description

technical field [0001] The invention relates to the field of micro-nano precise positioning, in particular to a two-degree-of-freedom micro-nano positioning platform. Background technique [0002] Micro-nano positioning technology has been widely used in many fields such as microelectronics engineering, precision and ultra-precision machining, biomedical engineering, and precision optical engineering. The higher performance requirements are coming; the micro-nano positioning platform is the most important basic component in the micro-nano positioning system, and the rationality of its structural design determines the performance of the positioning system. Therefore, it is of great significance to develop micro-nano positioning platforms with new configurations and excellent performance. [0003] In some occasions that require a large working stroke, a displacement amplification mechanism is usually designed and installed in the micro-nano positioning platform to amplify the...

Claims

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Application Information

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IPC IPC(8): G12B5/00
CPCG12B5/00
Inventor 纪华伟李天翼
Owner HANGZHOU DIANZI UNIV
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