Substrate loading system and substrate loading method thereof

Abstract

The invention provides a substrate loading system and a loading method thereof, the system includes a loading device, and at least one substrate storage cassette, the substrate storage cassette is movably accommodated in the loading device; the loading device includes At least one box, and a lifting mechanism matched with the box, the lifting mechanism includes a driving assembly and a lifting assembly; the substrate storage cassette includes a storage box, and a substrate placement assembly, and the substrate placement assembly matches the lifting mechanism , the lifting mechanism drives the substrate placement assembly into the storage box or draws it out from the storage box through the lifting assembly. The beneficial effect of the present invention is reflected in: the substrate cleaning is separated from the evaporation production line, and the clean substrate is stored in a dry nitrogen environment to prevent contamination of the substrate surface; this solution only needs two independent boxes on the production line , and multiple small substrate storage chambers; through two independent substrate loading boxes, the work is exchanged to meet the tape-out requirements of OLED equipment.

Description

technical field [0001] The invention belongs to the technical field of substrate vapor deposition, and in particular relates to a substrate loading system and a substrate loading method thereof. Background technique [0002] Organic thin-film electroluminescent display devices (OLED), as a field with broad application prospects, have developed rapidly in recent years, and there is a very large market demand every year. Today, the production of OLED panels is mainly in the form of assembly lines, and the production line can increase output to meet supply demand. ; [0003] The process flow of the OLED panel is to evaporate multiple layers of organic materials on a clean ITO substrate, and finally to coat a layer of metal electrodes. Before evaporating organic materials, it is necessary to ensure the cleanliness of the ITO substrate. Generally, the clean ITO substrate is placed in a vacuum or dry nitrogen environment to protect the ITO surface from contamination; today's larg...

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Problems solved by technology

Before evaporating organic materials, it is necessary to ensure the cleanliness of the ITO substrate. Generally, the clean ITO substrate is placed in a vacuum or dry nitrogen environment to protect the ITO surface from contamination; today's large-scale evaporation equipment cleans and bakes the substrate. Dry integration into the entire OLED production line has resulted in the size of the entire production line being too large. The cleaned ITO substrate will be placed in a vacuum chamber with a transmission device inside. Multiple vacuum chambers are arranged side by side to form a vacuum from Low to high vacuum gradient environment; after the substrate enters a cavity, the front valve is closed, the high pumping speed pump is turned on, the vacuum degree is increased, and the lower valve is opened to enter the next cavity

However, this scheme requires multiple cavities, and the size of each cavity is relatively large, and the selected pumping speed is relatively high, and the vacuum degree is required to be from 1bar to 1.0*10 -5 The transition of Pa leads to the high cost of OLED equipment in this scheme

[0004] For small-scale experimental evaporation equipment, there is generally an ITO substrate loading chamber, and each time it is opened, the ITO substrate is placed, and then vacuumed, which will easily cause the surface of the ITO substrate to be exposed to the air and cause serious pollution, which will affect the OLED panel. has a big impact on the performance of

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