Substrate processing apparatus including an ascending and descending guide part

A technology for a substrate processing device and a guiding part, which is applied in the fields of semiconductor/solid-state device manufacturing, electrical components, circuits, etc., and can solve problems such as increasing the size of the chamber

Active Publication Date: 2020-02-11
GIGALANE CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, since the chuck includes various structures such as a structure for fixing the substrate and controlling the temperature, there are problems that the size of the chamber is increased in order to ensure a space for the chuck to be raised and lowered inside the chamber; due to the weight of the chuck, Lifting requires more power; various structures included in the chuck should also be lifted together with the chuck

Method used

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  • Substrate processing apparatus including an ascending and descending guide part
  • Substrate processing apparatus including an ascending and descending guide part
  • Substrate processing apparatus including an ascending and descending guide part

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Embodiment Construction

[0044] Since the chuck 200 includes various structures such as a structure for fixing the substrate 10 and controlling the temperature, there is a problem that the size of the chamber 100 is increased in order to secure a space for the chuck 200 to rise inside the chamber 100; The weight of 200 requires more power for lifting; various structures included in the chuck 200 also need to be raised and lowered together with the chuck 200 .

[0045] To solve this problem, such as figure 1 and figure 2 As shown in the figure, the substrate processing apparatus including the lifting guiding part of the present invention includes a chamber 100 , a chuck 200 , a guiding part 500 , a linkage part 300 and a driving part 400 .

[0046] The chamber 100 includes a formation area 110 as a area for forming a processing substance, a processing area 120 as a region for processing the substrate 10 with the processing substance, and a discharge area 130 as a region connected to a pump to dischar...

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PUM

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Abstract

The present invention relates to a substrate processing apparatus including a guiding unit elevating in a chamber. The substrate processing apparatus including an elevating guiding unit according to the present invention includes: a chamber including a formation region as a region where a processing material is formed, a processing region as a region where a substrate is processed as the processing material, and a discharge region as a region connected to a pump where the processing material is discharged; a chuck installed in the chamber and causing the substrate to be positioned in the processing region with the substrate seated thereon; and a guiding unit going up in the chamber when the substrate is moved into or out of the chamber, going down in the chamber when the substrate is processed, having a guiding hole penetrating the middle such that a diameter gradually decreases in the direction of the processing region, and guiding the processing material formed in the formation region to the processing region through the guiding hole.

Description

technical field [0001] The present invention relates to a substrate processing apparatus including a guide that moves up and down inside a chamber. Background technique [0002] A substrate processing apparatus is an apparatus that performs a semiconductor process, specifically, an apparatus that processes a substrate with a processing substance. [0003] At this time, the substrate may mean a wafer or a tray on which the wafer is mounted, and the processing substance may mean gas or plasma for processing the substrate. [0004] For example, the substrate processing apparatus may be an apparatus that performs one or more of etching, vapor deposition, and ashing with plasma, or a device that performs vapor deposition with metal gas. [0005] Such a substrate processing apparatus includes a chamber. [0006] The inside of the chamber includes a formation region as a region for forming a processing substance, a processing region as a region for processing a substrate with the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/687H01L21/67
CPCH01L21/67011H01L21/68714H01L21/67739H01L21/6831H01L21/68742
Inventor 郑相坤金亨源权赫俊郑熙锡
Owner GIGALANE CO LTD
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