A nanoparticle size measurement method based on an improved Mask R-CNN
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- TIANJIN POLYTECHNIC UNIV
- Publication Date
- 2019-06-28
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
Technical field
[0001] The invention relates to a nano particle size measurement method based on an improved Mask R-CNN, which is used for the measurement of nano particle size and is more accurate than traditional algorithms in terms of accuracy and belongs to the field of image processing and deep learning. Background technique
[0002] Nanotechnology is widely used in industries such as catalysis science, medical drugs, new materials, power industry and composite materials, and has an important position in the entire high-tech field. Since many characteristics of nanomaterials have an important relationship with their particle size, shape and other microstructures, the characterization of the microstructure of nanomaterials is important for understanding the characteristics of nanomaterials, seeking application fields of nanomaterials, and promoting the development of nanomaterials. An important role, and the size measurement of nanoparticles is the key technology. At present...