Liquid immersion micro-channel measurement device and measurement method which are based on trapezoidal incident structure prism incident-type silicon

Abstract

The present invention relates to a liquid immersion micro-channel measurement device and measurement method which are based on trapezoidal incident structure prism incident-type silicon, and accordingto one embodiment of the present invention, the liquid immersion micro-channel measurement device based on trapezoidal incident structure prism incident-type silicon comprises: a micro-channel structure including a support and at least one micro-channel, which is formed on the support and has a sample detection layer to which a first bioadhesive material for detecting a first sample is fixed; a quadrangular pyramid-shaped prism formed on the upper part of the micro-channel structure; a sample injection unit for injecting, into the micro-channel, a buffer solution containing the first sample;a polarized light generation unit for emitting incident light polarized through the prism on the micro-channel at an incident angle that satisfies a p-wave non-reflection condition; and a polarized light detection unit for detecting, from the polarized incident light, a polarization change in a first reflection light reflected from the sample detection layer, wherein the prism completely reflects,from the polarized incident light incident on the prism, on an upper boundary surface of the prism, second reflection light reflected from a lower boundary surface of the prism and a boundary surfaceof the buffer solution injected into the micro-channel.

Description

technical field [0001] The invention relates to a liquid immersion microchannel measuring device and a measuring method based on trapezoidal incident structure prism incident type silicon. Background technique [0002] Reflectometry and ellipsometry are optical analysis techniques that measure changes in the reflectance or polarization state of reflected light reflected from a sample surface and analyze the measurements to find out the thickness and optical properties of the sample. [0003] Measuring equipment using the above-mentioned measuring method includes reflectometers and ellipsometers. Measuring equipment is used to evaluate the thickness and physical properties of various nanoscale thin films during the manufacture of nano thin films for the semiconductor industry. In addition, efforts are being made to extend the range of applications to the bioindustry to apply them to the interface analysis of biomaterials such as proteins, DNA, viruses, and new drug materials...

AI Technical Summary

Problems solved by technology

However, there is a problem in that the measurement sensitivity for analysis of low-molecular-weight biomaterials requiring a sensitivity in the range of approximately 1 to 0.001 nm is low, and thus reliability is reduced

[0021] However, if image 3 As shown, when the interval between the bottom surface of the prism and the substrate material is small, it is difficult to separate the light reflected from the interface of the prism and the buffer solution from the light reflected from the substrate material

Since measurements are made under p-wave non-reflecting conditions, there may be a problem in that measurement errors are caused due to the intensity of light reflected from the substrate material being weaker than that reflected from the interface of the prism and the buffer solution

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