Unlock instant, AI-driven research and patent intelligence for your innovation.

Etching system for preparing anti-glare glass and preparation method thereof

An anti-glare and etching technology, applied in the field of electro-etching, can solve the problems of complex process and inability to guarantee accuracy.

Pending Publication Date: 2019-09-03
江苏加拉泰克微电子有限公司
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above-mentioned methods are usually more complex in process, and the accuracy cannot be guaranteed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching system for preparing anti-glare glass and preparation method thereof
  • Etching system for preparing anti-glare glass and preparation method thereof
  • Etching system for preparing anti-glare glass and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] In order to enable those skilled in the art to better understand the technical solutions in the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described The embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.

[0021] Such as Figure 1 to Figure 3 As shown, the present invention provides an etching system for preparing anti-glare glass, and the etching system is used to etch the glass substrate 7 to form anti-glare glass. The inside of the etching system is in a vacuum state. It should be noted that the vacuum state in the etching system is ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an etching system for preparing anti-glare glass and a preparation method thereof. The etching system is in a vacuum state, and comprises: a first power supply; an electrode device arranged at one side of the glass substrate to drive plasma to impact on the glass substrate; and a gas supply source used for communicating with the electrode device to supply gas atoms. An accommodating cavity is formed in the electrode device, and the electrode device comprises an anode plate and a cathode plate which are both arranged at one side of the glass substrate in parallel, the anode plate is arranged closer to the glass substrate, the anode plate and the cathode plate are respectively electrically connected with the anode and the cathode of the first power supply to supply electrons, the anode plate is provided with an exit communicating with the accommodating cavity to allow the plasma to pass through, the cathode plate is provided with an inlet communicating the accommodating cavity and the gas supply source; and the electrode device further comprises a first magnetic plate and a second magnetic plate which are opposite in magnetic pole, connected between the anodeplate and the cathode plate, and are arranged perpendicular to the anode plate to drive electrons to move and impact the gas atoms to form the plasma.

Description

technical field [0001] The invention belongs to the field of electroetching, in particular to an etching system and a preparation method for preparing anti-glare glass. Background technique [0002] Glare is a common phenomenon in nature, which will cause many obstacles to human activities, and even damage human vision. In particular, when the car is driving at night, the lights when meeting cars are clustered lights, and the glare that shines into the car makes it difficult for the driver to see the objects in front, which is very dangerous for vehicle driving. When driving during the day, if the sunlight is too strong, glare will also appear at a certain angle when driving in the direction of the sun. [0003] In the prior art, an anti-glare film is usually prepared and attached to the glass, such as by printing, chemical etching and other methods. However, the above-mentioned methods usually have complicated processes, and the accuracy cannot be guaranteed. [0004] Th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32
CPCH01J37/32027H01J37/3266H01J37/32568H01J2237/334
Inventor 吴克坚王震宇
Owner 江苏加拉泰克微电子有限公司