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Cylindrical sputtering target and manufacturing method thereof

一种圆筒型、圆筒的技术，应用在圆筒型溅射靶及其制造领域，能够解决偏差机械强度、相对密度差等问题，达到均质性高的效果

Active Publication Date: 2021-12-21
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problems in the manufacture of elongated cylindrical sintered bodies are the difference in relative density within the sintered body (i.e., "in-solid variation" in the density of the sintered body) and mechanical strength

Method used

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  • Cylindrical sputtering target and manufacturing method thereof
  • Cylindrical sputtering target and manufacturing method thereof
  • Cylindrical sputtering target and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0043] use figure 1 and figure 2 , the configuration and the outline of the configuration of the cylindrical sputtering target and the cylindrical sintered body according to the embodiment of the present invention will be described.

[0044] [Outline of Cylindrical Sputtering Target]

[0045]figure 1 It is a perspective view which shows an example of the cylindrical sintered body which comprises the cylindrical sputtering target concerning embodiment of this invention. Such as figure 1 As shown, the cylindrical sputtering target 100 has a plurality of cylindrical sintered bodies 110 having a hollow structure. The plurality of cylindrical sintered bodies 110 are arranged adjacent to each other with a certain interval therebetween. here, in figure 1 In the figure, for convenience of description, the distance between adjacent cylindrical sintered bodies 110 is shown enlarged. Its details are as figure 2 As shown, the cylindrical base material 130 for holding the cylindri...

Embodiment 1

[0098] In Example 1, a method for producing a cylindrical ITO target (cylindrical sintered body) will be described. First, as a raw material powder, a BET (Brunauer, Emmet and Teller’s equation, BET equation) with a specific surface area of ​​4.0 to 6.0m was prepared. 2 / g of 4N indium oxide and BET specific surface area is 4.0 ~ 5.7m 2 / g or less 4N tin oxide. Here, the BET specific surface area means the surface area calculated by the BET equation. The so-called BET equation refers to the gas adsorption method that adsorbs gas molecules such as nitrogen, argon, krypton, and carbon monoxide on solid particles, and measures the specific surface area of ​​solid particles from the amount of adsorbed gas molecules. Here, the raw materials were weighed so that indium oxide contained 90% by mass and tin oxide contained 10% by mass. Next, these raw material powders are pulverized and mixed with a wet ball mill. Here, zirconia balls are used as grinding media. Using a spray drye...

Embodiment 2

[0122] In Example 2, a cylindrical sintered body obtained by sintering a cylindrical molded body longer than that of Example 1 in the direction of the cylinder axis will be described. The molding process of the cylindrical molded body is the same as that of Example 1, and thus the description thereof will be omitted.

[0123] The parameters of the cylindrical molded body of Example 2 obtained through the same molding process as in Example 1 are as follows.

[0124] ·Cylinder outer diameter (diameter) = 193.8mm

[0125] · Cylinder inner diameter (diameter) = 158.2mm

[0126] ·Cylinder thickness = 17.8mm

[0127] ・Length in the direction of cylinder axis = 1200mm

[0128] Next, the cylindrical molded body was sintered using an electric furnace. The sintering conditions of Example 2 are the same as those of Example 1 except for the parameters of the introduction of oxygen into the hollow portion inside the cylindrical molded body, and thus the description thereof will be omit...

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Abstract

An object of the present invention is to provide a cylindrical sintered body having a length of 470 mm or more in the cylindrical axial direction, a cylindrical sputtering target, and methods for producing them. A method of manufacturing a cylindrical sputtering target according to an embodiment of the present invention is: in the method of manufacturing a cylindrical sputtering target having a cylindrical sintered body, a cylinder having a length of 600 mm or more in the direction of the cylinder axis is The molded body is disposed on a pedestal provided with an oxygen supply port connected to a pipe for oxygen supply, from the oxygen supply port to the Sintering is performed while supplying oxygen in the direction of the cylinder axis. In addition, in another aspect, the pedestal may be arranged in the chamber, and a pipe for supplying oxygen may be connected to the oxygen supply port from outside the chamber.

Description

[0001] This application is a divisional application of a Chinese patent application with an application date of February 28, 2017, an application number of 201710112294.0, and an invention title of "cylindrical sputtering target and its manufacturing method". technical field [0002] The invention relates to a cylindrical sputtering target and a manufacturing method thereof. In particular, this invention relates to the manufacturing method of the cylindrical sintered body which comprises a cylindrical sputtering target. Background technique [0003] In recent years, the manufacturing technology of flat panel displays (FPD: Flat Panel Display) and solar cells has developed rapidly, and the size has been continuously promoted. And, with the expansion of these markets, the demand for large glass substrates is increasing. [0004] In particular, in sputtering devices that form metal thin films or metal oxide thin films on large glass substrates, cylindrical (also called rotary ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/08
CPCC23C14/086C23C14/3414C04B35/64C04B35/457C04B2235/3293C04B2235/6583C04B2235/6586
Inventor 馆野谕长田幸三
Owner JX NIPPON MINING & METALS CORP