Gas-barrier aluminum vapor-deposited film and laminated film using the same
A gas barrier and evaporation film technology, applied in vacuum evaporation coating, devices for coating liquid on the surface, coatings, etc. problem, to achieve the effect of excellent oxygen and water vapor barrier properties
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Embodiment 1
[0080] As the base film, a biaxially stretched polyethylene terephthalate film ("Lumirror" (registered trademark) P60 manufactured by Toray Co., Ltd.) with a film thickness of 12 μm was used, and a roll-to-roll vacuum deposition machine was used. The crucible-type aluminum evaporation source for high-frequency induction heating was continuously formed so that the aluminum metal layer had a film thickness of 40 nm and the aluminum oxide layer had a film thickness of 10 nm. On the base film, in a region of a certain width in the traveling direction of the base film on the cooled rotating drum, the film of the composition corresponding to its position is sequentially formed along the thickness direction. Oxygen is supplied from the last vapor-deposited position, thereby forming a vapor-deposited layer that changes continuously from an aluminum metal layer to an aluminum oxide layer.
[0081] Next, an aqueous solution having the following composition was applied on the vapor-depos...
Embodiment 2
[0086] A gas-barrier aluminum vapor-deposited film was obtained in the same manner as in Example 1 except that the deposited layer was formed so that the aluminum metal layer had a film thickness of 25 nm and the aluminum oxide layer had a film thickness of 5 nm.
Embodiment 3
[0088] A gas-barrier aluminum vapor-deposited film was obtained in the same manner as in Example 1, except that the deposited layer was formed so that the aluminum metal layer had a film thickness of 80 nm and the aluminum oxide layer had a film thickness of 20 nm.
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