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Device for cleaning photomask

A technology of photomasks and cleaning chambers, applied in the field of photomasks, can solve the problems of low cleaning efficiency of photomask cleaning machines, and achieve the effect of improving cleaning efficiency

Active Publication Date: 2019-11-29
江苏壹度科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The photomask needs to be cleaned before use. The cleaning of the photomask in the photomask cleaning machine is mainly divided into front cleaning and back cleaning. The cleaning efficiency of the existing photomask cleaning machine is not high. The liquid is splashed to the cleaned side, in view of this, we propose a device for cleaning the photomask

Method used

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  • Device for cleaning photomask
  • Device for cleaning photomask
  • Device for cleaning photomask

Examples

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Embodiment Construction

[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describin...

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PUM

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Abstract

The invention relates to the technical field of photomasks, in particular to a device for cleaning a photomask. The device comprises a base, wherein a cleaning chamber is arranged on the top of the base; a first through hole is vertically formed in the bottom center of the cleaning chamber; a plurality of first annular brushes are arranged at the bottom of the cleaning chamber and at the positionnear the first through hole from inside to outside; and a top cover is arranged on the top of the cleaning chamber, a second groove is arranged at the bottom of the top cover, an annular cylinder slotis arranged at the bottom center of the second groove, and a plurality of second annular brushes are arranged at the bottom of the second groove and at the position close to the annular cylinder slotfrom inside to outside. According to the device for cleaning the photomask, the photomask can be fixed through a first fixing disk and a second fixing disk, and the two surfaces of the photomask canbe cleaned simultaneously by the first and second annular brushes; and clean pure water can be injected through a water inlet interface in the cleaning process, and the water after cleaning can be discharged through a water outlet interface, so that the cleaning efficiency of the photomask is improved.

Description

technical field [0001] The invention relates to the technical field of photomasks, in particular to a device for cleaning photomasks. Background technique [0002] The photomask needs to be cleaned before use. The cleaning of the photomask in the photomask cleaning machine is mainly divided into front cleaning and back cleaning. The cleaning efficiency of the existing photomask cleaning machine is not high, and when turning over, it is easy to wash the mask The liquid is splashed to the cleaned side, and in view of this, we propose a device for cleaning the photomask. Contents of the invention [0003] The object of the present invention is to provide a device for cleaning a photomask, so as to solve the problems raised in the background art above. [0004] To achieve the above object, the present invention provides the following technical solutions: [0005] A device for cleaning a photomask, comprising a base, the surface of the base is provided with a first groove, th...

Claims

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Application Information

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IPC IPC(8): B08B1/04B08B3/10B08B13/00
CPCB08B3/10B08B13/00B08B1/12B08B1/32
Inventor 凌永康张勇杜良辉
Owner 江苏壹度科技股份有限公司