A kind of composite lubricating film and its preparation method, workpiece

Abstract

The invention belongs to the technical field of solid lubrication, and in particular relates to a composite lubricating film, a preparation method thereof, and a workpiece. The composite lubricating film of the present invention is composed of a lubricating material and doping elements Ti and La, and the lubricating material is MoS 2 or WS 2 ; The mass percentage content of Ti element in the composite lubricating film is 1.5-11%, and the mass percentage content of La element is 4.5-13.5%. The invention adopts the magnetron sputtering method to prepare the composite lubricating film, and introduces La element and Ti element during the growth process of the film to effectively refine the MoS 2 or WS 2 The crystal grains make the structure of the composite lubricating film denser, thus effectively improving the performance of the solid lubricating film.

Description

technical field [0001] The invention belongs to the technical field of solid lubrication, and in particular relates to a composite lubricating film, a preparation method thereof, and a workpiece. Background technique [0002] Transition metal sulfides such as MoS with common layered structure 2 、WS 2 The crystal is a hexagonal structure formed by S-M-S (M=W, Mo) atoms. The layers are bonded by strong chemical bonds and the layers are bonded by weak Van der Waals bonds. The layers are easy to slide and have good lubrication. Therefore, it is often used as a solid lubricant in moving parts such as bearings, gears, knives, and processing molds. But since MoS 2 、WS 2 The unsaturated dangling bonds at the edge of the crystal are chemically active and easily oxidized, resulting in a sharp drop in its frictional properties and loss of lubrication; currently, magnetron sputtering is often used to deposit MoS by sputtering 2 and WS 2 Thin film, in the deposition process, the gr...

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Problems solved by technology

But since MoS 2 、WS 2 The unsaturated dangling bonds at the edge of the crystal are chemically active and easily oxidized, resulting in a sharp drop in its frictional properties and loss of lubrication; currently, magnetron sputtering is often used to deposit MoS by sputtering 2 and WS 2 Thin film, during the deposition process, the growth mode of the film is columnar growth, the porosity is high, and its mechanical properties are poor

[0003] Studies have shown that doping is a simple and effective method to improve the performance of thin films. Common doping elements include Ti, Cr, Al, etc., and the introduction of multiple elements can effectively make up for the deficiency of a single doping element and achieve a complementary advantage. effect, so binary or multi-component co-doped thin films have potential research value, but the current research on MoS 2 or WS 2 The research of doping Ti element and La element in thin film has not been reported yet

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