A kind of preparation method of high performance zif-l/vanadium dioxide composite film
A ZIF-L, composite film technology, applied in the field of materials, can solve the problems of low solar light regulation efficiency, low visible light transmittance, and high phase transition temperature, and achieve visible light transmittance and solar light regulation efficiency improvement, Simple preparation method, easy operation and control effect
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[0031] (3) Preparation of ZIF-L sol
[0032] Use an electronic analytical balance to weigh 2.7439g-5.4878g of zinc acetate dihydrate and 1.0263g-2.0525g of dimethylimidazole, respectively, and place them in a 30mL transparent glass bottle with magnets, and then add 5mL-25mL of methanol solvent , placed on a magnetic stirrer at room temperature and stirred for 2-6 hours to obtain a transparent ZIF-L sol.
[0033] (4)ZIF-L / VO 2 Preparation of composite films
[0034] The surface of the pure M-phase vanadium dioxide film prepared in step (2) is blown clean, placed in a spin coater, and the ZIF-L sol prepared in step (3) is evenly coated on the vanadium dioxide film for spin coating , the number of steps of the spin coater is set to 1-2 steps, the spin coating speed is 1500r / min-4500r / min, and the spin coating time is 10-30s. Spin-coated ZIF-L / VO 2 The composite film is heated and cured on a digital display heating table, and the curing temperature of the digital display heati...
Embodiment 1
[0037](1) Clean the glass substrate, the process is as follows: first clean the glass surface with detergent, then add distilled water for ultrasonic cleaning for 30 minutes, and finally put it in absolute ethanol for ultrasonic cleaning for 30 minutes, and then put the cleaned glass sheet into anhydrous Sealed in ethanol for later use.
[0038] (2) Prepare a pure metal vanadium film on the above-mentioned substrate by DC magnetron sputtering, dry the quartz glass substrate, fix it on the substrate stage with a high-temperature-resistant adhesive tape, put it in the magnetron sputtering studio, Put in a metal vanadium target (purity 99.99%), the substrate temperature is 40°C during the sputtering process, first use a mechanical pump to draw a low vacuum to 15Pa, then use a molecular pump to fine pump to 3.0×10-3Pa, and pass in the reaction gas argon (purity is 99.9%), the flux of argon gas is 100 sccm (standard milliliters / minute), and the air pressure in the chamber is stable...
Embodiment 2
[0043] (1) Clean the glass substrate, the process is as follows: first clean the glass surface with detergent, then add distilled water for ultrasonic cleaning for 50 minutes, and finally put it in absolute ethanol for ultrasonic cleaning for 50 minutes, and then put the cleaned glass sheet into anhydrous Sealed in ethanol for later use.
[0044] (2) Prepare a pure metal vanadium film on the above-mentioned substrate by DC magnetron sputtering, dry the quartz glass substrate, fix it on the substrate stage with a high-temperature-resistant adhesive tape, put it in the magnetron sputtering studio, Put in a metal vanadium target (purity 99.99%). During the sputtering process, the substrate temperature is 80°C. First use a mechanical pump to evacuate to 15Pa, then use a molecular pump to fine pump to 1.0×10-3Pa, and then pass in the reaction gas argon (purity is 99.9%), the flux of argon gas is 200 sccm (standard milliliters / minute), until the pressure in the cavity is stabilized ...
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