A sic doped ta x hf 1-x cCeramics and their preparation methods
A taxhf1-xc, ta1-xhfxc technology, applied in the field of high-temperature ceramics, can solve the problems of poor ceramic uniformity, poor high-temperature oxidation resistance, and inability to form a protective film, achieving low cost, short production cycle, and improved high-temperature oxidation resistance. Effect
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Embodiment 1
[0028] A SiC doped Ta x f 1-x C ceramics and methods of making them. The steps of the preparation method described in this embodiment are:
[0029] Step 1, by anhydrous alcohols: acetylacetone: tantalum salt: hafnium salt: the ratio of the amount of substance of carbon source is 2: (0.25~0.29): (1-x): x: (0.2~0.35), 0.01 ≤x≤0.15; mix anhydrous alcohols, acetylacetone, tantalum salts, hafnium salts and carbon sources, and stir at 60-70°C and 500-1200r / min for 1.75-2h to obtain a tantalum-hafnium complex.
[0030] Step 2, heat the tantalum-hafnium complex at 230-240°C for 0.5-0.9h, and distill at 60-120°C for 1-1.5h to obtain Ta 1-x f x C ceramic precursor, 0.01≤x≤0.15.
[0031] Step 3, according to the Ta 1-x f xC ceramic precursor: the mass ratio of silicon source is 1: (0.1~0.5), and described Ta 1- x f x The C ceramic precursor is uniformly mixed with the silicon source to obtain a sol.
[0032] Step 4, according to the sol: ethanol: the mass ratio of deionized wa...
Embodiment 2
[0040] A SiC doped Ta x f 1-x C ceramics and methods of making them. The steps of the preparation method described in this embodiment are:
[0041] Step 1, by anhydrous alcohols: acetylacetone: tantalum salt: hafnium salt: the ratio of the amount of substance of carbon source is 2: (0.29~0.33): (1-x): x: (0.35~0.5), 0.15 ≤x≤0.30; mix anhydrous alcohols, acetylacetone, tantalum salt, hafnium salt and carbon source, stir at 70-80°C and 500-1200r / min for 1.5-1.8h to obtain a tantalum-hafnium complex.
[0042] Step 2, heat the tantalum-hafnium complex at 220-230°C for 0.8-1.2h, and distill at 60-120°C for 1-1.5h to obtain Ta 1-x f x C ceramic precursor, 0.15≤x≤0.30.
[0043] Step 3, according to the Ta 1-x f x C ceramic precursor: the mass ratio of silicon source is 1: (0.4~0.8), and described Ta 1- x f x The C ceramic precursor is uniformly mixed with the silicon source to obtain a sol.
[0044] Step 4, according to the mass ratio of described sol: ethanol: deionized w...
Embodiment 3
[0052] A SiC doped Ta x f 1-x C ceramics and methods of making them. The steps of the preparation method described in this embodiment are:
[0053] Step 1, by anhydrous alcohols: acetylacetone: tantalum salt: hafnium salt: the ratio of the amount of substance of carbon source is 2: (0.33~0.37): (1-x): x: (0.5~0.65), 0.30 ≤x≤0.45; mix anhydrous alcohols, acetylacetone, tantalum salt, hafnium salt and carbon source, and stir at 80-90°C and 500-1200r / min for 1.25-1.5h to obtain a tantalum-hafnium complex.
[0054] Step 2, heat the tantalum-hafnium complex at 210-220°C for 1.1-1.5h, and distill at 60-120°C for 1-1.5h to obtain Ta 1-x f x C ceramic precursor, 0.30≤x≤0.45.
[0055] Step 3, according to the Ta 1-x f x C ceramic precursor: the mass ratio of silicon source is 1: (0.7~1.1), described Ta 1- x f x The C ceramic precursor is uniformly mixed with the silicon source to obtain a sol.
[0056] Step 4, according to the mass ratio of described sol: ethanol: deionized ...
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