Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Minimum closed loop automatic forming method applied to disconnected pattern spots

A closed-loop and patch technology, applied in the field of patch processing, can solve the problems of high cost, uneven data quality, and large labor input, so as to improve efficiency and quality, reduce data quality problems, and save data processing costs. Effect

Pending Publication Date: 2020-02-28
空间信息产业发展股份有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the current method of manually drawing the smallest closed loop can solve the problem, the cost will be relatively high due to the relatively large manual investment, and because the knowledge level of each operator is inconsistent, it will lead to the data produced by different operators. uneven quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Minimum closed loop automatic forming method applied to disconnected pattern spots
  • Minimum closed loop automatic forming method applied to disconnected pattern spots
  • Minimum closed loop automatic forming method applied to disconnected pattern spots

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Such as figure 1 As shown, a method for automatically forming a minimum closed circle applied to disjoint map spots is characterized in that it includes the following steps:

[0032] S1. Set the buffer distance of the pattern;

[0033] S2. Perform outward buffering for each original patch in turn, and find all unconnected original patches within the buffer distance;

[0034] S3. Merging all the found original patches together to form a first merged patch;

[0035] S4. Merge the outwardly buffered patches of each original patch to form a second merged patch;

[0036] S5. Buffering the second merged patch inward by a set buffer distance to form a buffered patch;

[0037] S6. Perform topological processing on the buffered patch and the first combined patch to form a topological patch;

[0038] S7. Merge the topological patch with the first merged patch to form a minimum closed circle.

[0039] The buffer distance in step S1 of the embodiment of the present invention i...

specific example

[0057] Take the original spot A, the original spot B, the original spot C, and the original spot D as examples, where the distance between the original spot A and the original spot B is 25 meters, and the distance between the original spot B and the original spot The distance between C is 10 meters, and the distance between original spot C and original spot D is 60 meters;

[0058] 1) Set the buffer distance of the map spot to 50 meters;

[0059] 2) Taking the original patch A as the starting patch, the original patch A is buffered outward by 50 meters to form a patch A', which is found by overlapping topology analysis between the patch A' and other original patches within the set range. Original patch B;

[0060] 3) The original patch B is buffered outward by 50 meters to form a patch B', and the original patch C is found by performing overlapping topology analysis between the patch B' and other original patches within the set range;

[0061] 4) The original patch C is buff...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a minimum closed loop automatic forming method applied to disconnected pattern spots, which comprises the following steps of setting a buffer distance, finding all required pattern spots according to a pattern topological relation among the pattern spots, and automatically forming a minimum closed loop based on the found pattern spots. According to the method provided by the invention, existing people engaged in the work are liberated from complicated data, so that the data quality problem caused by misoperation of operators is reduced, the data processing efficiency and quality are improved, and the data processing cost is saved.

Description

technical field [0001] The invention belongs to the technical field of pattern processing, and in particular relates to a method for forming disjoint pattern spots into a minimum closed circle. Background technique [0002] Plots refer to single-type land parcels, and single-type land parcels divided by administrative demarcation lines, land ownership boundaries or linear features. Specifically, there are many division requirements for the division of maps and spots. The map spots are divided according to the last level of land classification in the "Analysis of Land Use Status", including urban land, town land, village land, mining land, scenic spots and special land. The plot formed by the closed boundary line outside is a map patch; the linear features with a width greater than 2mm on the map are divided into map spots; the administrative area boundary, land ownership boundary, single-line linear feature, and land type boundary divide the land Blocks form spots, etc. At...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F16/29
CPCG06F16/29
Inventor 李昌松刘兵
Owner 空间信息产业发展股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com