99 results about "Pattern processing" patented technology

A system includes a memory configured to store a software application and a plurality of microservices including a set of independent software service components configured to be independently executed. The system includes processors operably coupled to the memory and configured to receive a request to initiate an execution of interactions with the software application for satisfying the request, and to identify, based on the request, one or more microservices to be executed to initiate the execution of the interactions with the software application. The processors further execute one or more generative machine-learning models trained to identify anomalous interservice interaction patterns between the one or more microservices. In response to identifying the anomalous interservice interaction patterns, the processors dynamically update operations processes associated with the one or more microservices, and further execute the one or more microservices to initiate the execution of the one or more interactions with the software application.

A processor may capture network packets from a communication channel between a user and an application, the network packets comprising a data structure package. A processor may identify a schema of a payload used in the data structure package of the network packets. A processor may dynamically generate payload schema processing code using a machine learning dynamic protocol parser by applying a machine learning model to the schema of the payload, the payload schema processing code including a description of each field of the data structure package and a parser function for extracting a prompt. A processor may iterate the dynamically generating of the payload schema processing code until the payload schema processing code meets a predefined accuracy and functionality criteria that successfully extracts the prompt.

Matrix multiplication operations can be implemented, at least in part, on one or more tensor cores of a parallel processing unit. An efficiency of the matrix multiplication operations can be improved in cases where one of the input operands or the output operand of the matrix multiplication operation is a square matrix having a triangular data pattern. In such cases, the number of computations performed by the tensor cores of the parallel processing unit can be reduced by dropping computations and / or masking out elements of the square matrix input operand on one side of the main diagonal of the square matrix. In other cases where the output operand exhibits the triangular data pattern, computations can be dropped or masked out for the invalid side of the main diagonal of the square matrix. In an embodiment, a library implementing the matrix multiplication operations is provided.

The utility model relates to a conveying linkage mechanism which comprises a working table, a conveying disc, a conveying driver, a rotating carrier, a transmission assembly, a driving assembly and a butt joint assembly, the conveying disc is rotatably arranged on the working table, the conveying driver is fixedly connected with the working table, the conveying disc is in transmission connection with the conveying driver, the rotating carrier is rotatably arranged on the conveying disc, and the driving assembly is fixedly connected with the rotating carrier. The transmission assembly is connected with the rotary carrier and comprises a transmission gear, the driving assembly is arranged on the workbench in a sliding mode through the butt joint assembly and comprises a driving gear, and in the CD grain machining process, the driving gear is driven by the butt joint assembly to move towards the conveying disc, and the driving gear is meshed with the transmission gear so as to drive the rotary carrier to rotate. According to the utility model, the workpiece can be fixed and conveyed, the workpiece can be driven to rotate at a high speed in the machining process, and contribution is made to the design of a full-automatic CD grain machining device.

The application discloses an exposure method and an exposure device, and belongs to the field of printed circuit board production. The exposure method of the application processes the sub-picture data and the alignment process in parallel, effectively shortening the exposure time. The application can cache the processed picture data in the host computer or the exposure system. Meanwhile, the suction cup of the exposure device of the application has the freedom of four directions of X-axis, Y-axis, Z-axis and rotating shaft, can correct the deviation of the PCB plate through rotation and translation, thereby replacing the rotation and translation processing of the pattern according to the alignment result of the substrate mark point in the sub-picture system. The process reduces the time consumption of the pattern processing in the sub-picture system, further improves the equipment capacity, avoids the step-shaped deviation problem caused by the small-angle inclined line of the horizontal line after the pattern processing, ensures the analytical precision of the exposure pattern, and improves the exposure quality.

According to embodiments of this disclosure, a method, apparatus, and medium for pattern processing are provided. In the method, parameter information related to a lithography machine and a wafer in a lithography process is acquired. The lithography machine is used to form a wafer pattern on the wafer based on a target pattern. Based on the parameter information, a target state representation corresponding to the target pattern is determined from a plurality of candidate state representations indicating the electron beam scattering state. Based on the target state representation, a correction result for the target pattern is determined. In this manner, the state representation of the electron beam scattering state corresponding to the target pattern can be determined based on the parameter information of the lithography machine used and the parameter information of the wafer used for lithography, thereby simulating the lithography process more accurately. This ensures that the state representation used for lithography process simulation can more accurately describe the scattering state of the electron beam used by the lithography machine, improving the reliability of the simulation process and thus more accurately determining the correction result for the target pattern.

The application relates to the technical field of blind guiding, and particularly discloses an intelligent blind guiding instrument, which comprises a host computer internally provided with an MCU processor and a power module; a head-mounted device composed of a ring frame and a camera, a microphone and a loudspeaker mounted on the ring frame; and a blind guiding stick in Bluetooth connection with the MCU processor, wherein the MCU processor is in communication connection with a background server or a cloud server and loads an image database; the MCU processor is used for receiving image information sent by the camera and identifying and judging the image category, so as to control the blind guiding instrument to enter a voice navigation mode or a thing recognition mode; the MCU processor controls the blind guiding instrument to enter a voice control mode when detecting that the microphone sends predetermined voice content, so as to start or stop the blind guiding instrument or play predetermined audio. The above-mentioned intelligent blind guiding instrument combines the blind guiding stick with the head-mounted device, collects the images around the blind guiding stick to position a position to be guided, improves the navigation accuracy, has multiple functions, realizes one machine with multiple functions, and reduces the blind guiding cost of users.

The utility model relates to the technical field of reel processing, and discloses a reel antistatic flow line processing device which comprises a main frame, a polishing disc is arranged on the top face of the main frame, a positioning support is arranged on one side of the top of the polishing disc, the positioning support comprises a connecting frame, and the bottom end of the connecting frame is connected with a sleeve frame. A servo motor is arranged in the center of the interior of the connecting frame, a threaded rod is connected to the center of the bottom end of the servo motor, a telescopic rod is connected to the bottom end of the threaded rod, and scale marks are arranged on one side of the outer wall of the telescopic rod. According to the utility model, manual work is replaced by the adjustable telescopic rod and the clamping frame, and the lifting process can be kept accurate and controllable through the scale marks distributed on the outer wall of the telescopic rod, so that the situation that the normal product quality of the reel is influenced due to unstable flow line treatment process caused by excessive attachment of the reel clamped by the bottom clamping frame and the static electricity eliminating layer is avoided; and stable clamping is achieved through the anti-skid pieces on the inner walls of the clamping plates, and the high-precision adjustable and stable treatment process is formed.

The invention discloses a micro-nano pattern processing method, which comprises the following steps of: 1, pretreating a pattern electrode and a base material, preparing the pattern electrode matched with the outline of a micro-nano pattern to be processed, performing surface activation treatment, and performing cleaning and modification treatment on the base material; step two, functional material selection and pretreatment: selecting at least two functional materials, and performing dispersion and filtration treatment to form a stable functional material dispersion system; the method has the beneficial effects that synchronous loading of multiple functional materials is achieved through the electrostatic adsorption principle, multi-material micro-nano patterns can be prepared through one-time machining, and compared with a traditional step-by-step machining method, the machining efficiency is improved, and the machining period is remarkably shortened; the precise transfer device and the visual positioning module are adopted, precise alignment of a preformed pattern and a base material is achieved, the pattern size precision can reach the nanoscale, and the problem that in traditional multi-material machining, the alignment precision is low is solved.

The invention discloses a five-axis galvanometer light beam five-dimensional integrated error correction system based on machine vision. The system comprises a vision measurement system, a Qt software system and a computer. The vision measurement system comprises a rotary table, an industrial camera and camera control software, and the rotary table controls the machining plane to rotate; the industrial camera communicates with the computer through the camera control software to shoot and store patterns; the Qt software system comprises a pattern processing module, an error measurement module and an error correction module; the computer runs a Qt software system on the basis of a Qt Creator framework, and the pattern processing module is used for controlling the five-axis galvanometer processing system to process patterns; the error measurement module measures light beam five-dimensional error data; and the error correction module fits an error function through the error data and feeds back the error function to a processing system for correction. According to the invention, pure machine vision five-dimensional error measurement is realized only by using the correction pattern on a single workpiece.

A control method for controlling, by a processing unit (101), a mobile apparatus (200) capable of executing a first mode for performing work and being movable, wherein the mobile apparatus (200) is capable of executing a second mode for performing an operation to respond to the appearance of a subject (306) satisfying a predetermined condition, and the processing unit (101) switches the operation mode of the mobile apparatus (200) from the first mode to the second mode when the processing unit (101) has detected the subject (306).

This application provides a method, system, and mask for processing mask patterns. The method is applied to a mask formed by splicing at least two sub-masks, the mask including a splicing region formed based on the overlapping areas of adjacent sub-masks. The method includes: acquiring a mask pattern on the mask and splitting it into a splicing pattern and a non-splicing pattern; predicting the photolithography behavior of the mask pattern using a full-pattern optical proximity effect model of the corresponding mask pattern to obtain a predicted photolithography pattern; when a defect is detected in the predicted splicing photolithography pattern within the predicted photolithography pattern, adjusting the critical dimensions at the position corresponding to the defect in the splicing pattern according to the defect detection result and a critical dimension adjustment rule of the splicing pattern; and outputting the processed target mask pattern. This application improves the efficiency of defect processing for mask patterns located within the splicing region before mask fabrication.

An apparatus of a base station (BS), the apparatus comprising one or more processors coupled to memory and configured to decode, at the BS, a UE capability message received from a UE, the UE capability message comprising: one or more radio resource management (RRM) artificial intelligence (AI) model IDs of RRM AI models supported by the UE. The RRM AI models are configured to map to transmit beam patterns for a cell for RRM. The processors and the memory can encode, at the BS, assistance information for the UE from a serving cell of the BS, wherein the assistance information comprises: the RRM AI model IDs of the RRM AI models for the BS; and SSB index beam mappings for the RRM AI models by the BS. The UE can be performed RRM using the RRM AI models for the BS with the SSB index beam mappings.

The application relates to a semiconductor device and a manufacturing method thereof, comprising the following steps: providing a substrate, wherein an oxide layer is formed on the substrate; forming a laminated sacrificial layer and a patterned photoresist layer on the oxide layer, and performing a pattern processing on the sacrificial layer to expose part of the oxide layer; performing a first ion implantation process to implant ions into the substrate under the exposed oxide layer; removing the photoresist layer; performing a second ion implantation process to form a well region in the substrate under the exposed oxide layer; and removing the sacrificial layer; wherein the beam intensity of the second ion implantation process is greater than that of the first ion implantation process, and the implantation energy of the second ion implantation process is less than that of the first ion implantation process. The application reduces ion reflection in the ion implantation process, thereby reducing or even avoiding damage to the oxide layer, and effectively improving the performance and stability of the semiconductor device.

To provide a technique for suppressing deterioration in derivation accuracy of an angular velocity when using a three axis gyro sensor.SOLUTION: The triaxial B mode processing unit 300 includes an extended Kalman filter that derives an attitude angle of a moving object, and a first angular velocity derivation unit that derives an angular velocity based on a temporal change in the attitude angle derived by the extended Kalman filter. The 1-axis mode processing unit 200 includes a second angular velocity derivation unit that derives an angular velocity. The output unit 500 outputs one of the angular velocity derived by the first angular velocity derivation unit and the angular velocity derived by the second angular velocity derivation unit. The extended Kalman filter calculates a Kalman gain. In a case where the magnitude of the Kalman gain is smaller than the threshold value, the output unit 500 stops the output of the angular velocity derived by the second angular velocity derivation unit and performs switching to output the angular velocity derived by the first angular velocity derivation unit.SELECTED DRAWING: Figure 1

The invention provides an overprinted pattern processing method, an industrial printing control method and an industrial printing control system. The overprinted pattern processing method comprises the following steps: decomposing a target overprinted pattern into N printing layers, and defining alternating forward / reverse translation direction attributes for each printing layer; performing grating image processing on each printing layer to generate bitmap image data; y-axis mirror image overturning preprocessing is carried out on bitmap image data of the printing layer with the translation direction attribute being the reverse direction; and embedding registration mark pixel data in the first layer bitmap image data. According to the industrial printing control method, the UV flat plate ink-jet printing equipment is controlled to execute overprinting based on the processing result, printed materials are adsorbed and fixed to the same platform in the whole process, printing of all printing layers is sequentially completed through forward and reverse alternating translation of the platform along the Y axis, and interlayer alignment is completed through registration marks and a visual alignment system. According to the invention, the bitmap image data of the overprinted graph is adaptive to the forward and reverse alternate translation printing mode, and the position deviation introduced by layer-by-layer loading and unloading is eliminated.

Example embodiments of the present disclosure provide a mask pattern processing method, an electronic device and a storage medium. The method comprises obtaining an exposure energy distribution map corresponding to a mask pattern; determining at least two groups of distribution regions in the mask pattern representing distribution states of exposure energy based on the exposure energy distribution map; and transforming exposure energy distribution maps corresponding to the at least two groups of distribution regions respectively to generate an exposure energy distribution transformation map corresponding to the mask pattern. Embodiments of the present disclosure can efficiently generate a large number of electron microscope images by processing the mask pattern, overcoming the defects of high cost and low efficiency of known solutions.

A system includes a memory configured to store a software application and a plurality of microservices including a set of independent software service components configured to be independently executed. The system includes processors operably coupled to the memory and configured to receive a request to initiate an execution of interactions with the software application for satisfying the request, and to identify, based on the request, one or more microservices to be executed to initiate the execution of the interactions with the software application. The processors further execute one or more generative machine-learning models trained to identify anomalous interservice interaction patterns between the one or more microservices. In response to identifying the anomalous interservice interaction patterns, the processors dynamically update operations processes associated with the one or more microservices, and further execute the one or more microservices to initiate the execution of the one or more interactions with the software application.

The present application relates to methods, systems, and devices related to digital wireless communications, and more specifically, to methods, systems, and devices related to techniques related to traffic pattern handling. In one example aspect, a method of wireless communication is described. The method includes transmitting, by a first network function, a first message to a second network function, the first message including information related to a data flow, wherein the second network function is configured to derive a traffic pattern based on the information related to the data flow included in the first message. The method can further include receiving, by the first network function, a second message from the second network function, the second message including the derived traffic pattern.

A processor system and method, the processor system comprising a central processing unit (CPU) including a register for storing a stack pointer value, a non-volatile memory coupled to the CPU and having a first non-volatile memory region configured to store instructions executable by the CPU and a second non-volatile memory region configured to store a RAM image including program context data. The processor system includes a random access memory (RAM) coupled to the CPU and having a first RAM region and a second RAM region. The processor system is configured to have a first operating mode that does not preserve RAM data values and a second operating mode in which the RAM is powered. The processor system changes from the first operating mode to the second operating mode by applying power to the RAM, setting the stack pointer value to an address in the second RAM region, copying the program context data from the second non-volatile memory region to the first RAM region, and setting the stack pointer value to an address within a segment of the first RAM region.

The invention discloses a contact window detection method and device based on dynamic density clustering decision. The method comprises the following steps: collecting multi-source physical signals, and performing weighted summation on the multi-source physical signals based on a compensation coefficient to obtain a synthetic Tsyn signal; dividing the continuous synthetic Tsyn signal into a plurality of equal-width intervals and generating a histogram; extracting a maximum count value from the histogram and multiplying the maximum count value by a signal-to-noise ratio correlation coefficient k to serve as a main density threshold value; comparing the main density threshold value with a 0.05 quantile value of the synthesized Tsyn signal, and taking the larger value as a dynamic density threshold value; extracting a section which meets a dynamic density threshold and has a duration exceeding M in the continuous synthetic Tsyn signal as a feature sequence; judging the sample number of the signal amplitude in the feature sequence, and if the sample number is not greater than 5, processing and identifying the contact section by adopting a statistical mode; and if the number of the samples is greater than 5, processing and identifying the contact segment by adopting a clustering mode. According to the invention, real-time accurate identification of the contact window can be realized.

A system for detecting and mitigating application security threats comprises a processor associated with a server. The processor executes a static security model to analyze a group of development code sets for an application to detect threat objects. The processor determines that a number of threat objects in each development code set is lower than a threshold. The processor further executes a run-time security model to analyze the combined code sets to determine a set of threat object measurements of application product releases for the application. The processor generates a set of threat change ratios per application based on a first threat object measurement and the threat object measurements after the first threat object measurement. The processor determines threat change patterns of the threat change ratios associated with the application product releases for the application. The processor determines whether to trigger a development security model for the application.

The application provides a video rendering method and system based on a computing shader and Xpixmap, compared with an opengl display and a graphics pipeline mode, the computing shader can fully call general computing resources of a GPU, as long as the computing resources are sufficient, high resolution and high frame rate video rendering can be supported, and the processing capacity is greatly improved compared with the graphics pipeline mode. Compared with the opengl display mode, the use of the Xpixmap display mode reduces the multiple copying of the video frame, and further improves the efficiency of the video rendering and display. The scheme fully calls the computing resources of the GPU, renders YUV into RGBA and directly stores in the buffer area corresponding to the Xpixmap, and then uses the X function to submit the display, compared with the opengl display and the graphics pipeline mode, the scheme has higher efficiency, stronger processing capacity and adaptability, and is especially suitable for a graphics processing pipeline with insufficient capacity but powerful general computing capacity.

The invention relates to a deaf-mute barrier-free concert interaction system and method based on multi-modal dynamic mapping. The system comprises a wearable tactile execution unit, an AI processing unit, a multi-mode synchronous controller and a VR interaction module, and the tactile execution unit outputs multi-dimensional vibration modes to different body areas through differentially arranged linear resonance actuators. The AI processing unit maps real-time audio features into tactile parameters based on a contrast learning model and balances experience and energy consumption through the optimization module, the multi-mode synchronous controller achieves millisecond alignment of audio, vision and tactile, and the VR interaction module maps sign language input into a virtual scene and a tactile feedback adjustment instruction. Through the innovative tactile layout and the cross-modal mapping model, the immersion, rhythm perception and safety of the deaf-mute user are remarkably improved, and the method is suitable for various scenes such as concerts, education and rehabilitation.

The embodiment of the invention provides a task processing method and device, equipment, a storage medium and a program product, and relates to the technical field of data processing. According to the method, tasks of a to-be-processed batch are obtained, batch task files corresponding to the tasks of the to-be-processed batch are generated, then a distributed task processing cluster is scheduled to process the tasks based on the batch task files in a file mode, and the task processing efficiency is improved under the condition that target tasks failing to be processed exist. The distributed task processing cluster is dispatched to process the target task in the streaming mode, the technical effect of dynamically regulating and controlling the processing mode of the task according to the execution result of the task is achieved, the target task is processed in the streaming mode, and the problem that the task processing efficiency is reduced due to the fact that the target task continues to be processed in a file mode is solved.

The invention discloses a non-autoregressive pedestrian trajectory prediction method based on Transform. The method comprises a data preprocessing and basic feature construction step, a pedestrian motion mode processing step, a spatial-temporal feature coding step, a target prediction step and a trajectory generation step. Wherein the data preprocessing and basic feature construction step is used for performing preprocessing and feature construction on an input pedestrian historical track; in the pedestrian motion mode processing step, the two inputs are embedded and added to obtain a final input, and the final input is embedded into a pedestrian spatial-temporal feature coding step in the next step; in the spatial-temporal feature coding step, a historical motion track of a pedestrian is converted into feature representation rich in spatial-temporal semantics; the target prediction step directly deduces the possible final position of a pedestrian in the future and the corresponding confidence coefficient, namely the probability, from pedestrian motion features based on a pedestrian motion mode, and the track generation step is used for generating a prediction track. According to the scheme, efficient and stable pedestrian trajectory prediction is realized.

The invention discloses a vertical navigation method based on a state machine. The method comprises the following steps: S1, acquiring vertical navigation parameters sent from an autopilot and aircraft state parameters output by an atmosphere data calculation module in real time; s2, acquiring flight plan information from a flight management system, and acquiring a next effective height constraint from the currently activated flight plan; s3, when the effective height constraint is obtained, calculating the required vertical speed RVS from the current position to the height constraint; s4, executing a vertical navigation state machine, and processing each state of the state machine according to the current state of the airplane and the vertical mode received from the autopilot; and S5, processing the output of each state of the state machine to obtain a vertical navigation instruction, sending the vertical navigation instruction to the autopilot, and completing closed-loop interaction with the autopilot. Based on the mechanism of the state machine, the automatic state switching of the vertical navigation is realized, and the safety efficiency and the automation degree of the vertical navigation are improved.

The invention discloses a service request processing method, device and equipment, a readable storage medium and a product, and is applied to the field of service request, the method comprises the following steps: receiving and analyzing a service request to obtain an analysis result, the analysis result comprising a target request feature set corresponding to the service request; determining a target historical feature set meeting a preset matching condition with the target request feature set; determining target historical execution time and a target historical execution mode corresponding to the target historical feature set; under the condition that the target historical execution time is smaller than a first preset threshold value, processing the service request through a target historical execution mode; under the condition that the target historical execution time is not less than a first preset threshold value, processing the service request through a first mode; wherein one of the first mode and the target historical execution mode is a synchronous mode, and the other one is an asynchronous mode. According to the method, the service request processing flexibility is improved.

The invention discloses a multi-source heterogeneous data management method and device, electronic equipment and a storage medium, and the method comprises the steps: dynamically selecting a first processing node through a mode analysis model based on a mode processing performance parameter of a data cleaning node; dynamically selecting a second processing node through a timestamp calibration model based on a time calibration performance parameter of the time sequence calibration node; dynamically selecting a third processing node through a value domain conversion model based on the code conversion performance parameter of the code conversion node; and executing a mode conflict analysis task by using the first processing node, executing a time sequence calibration task by using the second processing node, executing a coding system conversion task by using the third processing node, and generating standardized data. An end-to-end data governance process from mode analysis to time sequence calibration to code conversion is formed, finally, a data set with a unified structure, time alignment and code standardization is generated, and the data governance efficiency and accuracy are remarkably improved.

The invention relates to the technical field of lasers, in particular to a preparation method of a low-power-consumption mid-infrared quantum cascade laser, and the method comprises the steps: providing an epitaxial wafer which comprises an initial lower waveguide layer, an active layer and an initial upper waveguide layer which are stacked in sequence; patterning processing is carried out on the epitaxial wafer with partial thickness to form a substrate and an initial ridge-shaped structure located on the substrate, a groove is formed in the side face of the initial ridge-shaped structure, and the initial ridge-shaped structure comprises a lower waveguide layer, an initial active region and an upper waveguide layer which are sequentially stacked in the direction away from the substrate; the initial active region is transversely etched through the groove so as to remove the initial active region with a part of width, the remaining initial active region serves as an active region, the width of the upper waveguide layer and the width of the lower waveguide layer are both larger than the width of the active region, and the lower waveguide layer, the active region and the upper waveguide layer form a ridge-shaped structure. According to the invention, the preparation difficulty of the quantum cascade laser with the narrow ridge is at least reduced, and a narrower active region can be prepared.