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Cleaning device for chemical equipment

A cleaning device and chemical equipment technology, applied in lighting and heating equipment, cleaning hollow objects, drying gas layout, etc., can solve the problems of affecting the cleaning effect, low manual cleaning efficiency, insufficient cleaning, etc. The effect of accelerating moisture distribution and shortening cleaning time

Inactive Publication Date: 2020-03-24
章红忠
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a cleaning device for chemical equipment, to solve the following problems in the existing cleaning technology for chemical equipment proposed in the above-mentioned background technology: the existing way of cleaning chemical tanks is mainly carried out manually, Manually scrub the inner surface with a brush. However, manual cleaning is inefficient and labor-intensive, and the cleaning is not clean enough and thorough, which affects the cleaning effect.

Method used

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  • Cleaning device for chemical equipment
  • Cleaning device for chemical equipment
  • Cleaning device for chemical equipment

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Embodiment Construction

[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0019] see Figure 1-3 , the present invention provides a technical solution: a cleaning device for chemical equipment, including a chemical barrel 1 and a cover plate 2, the bottom of the chemical barrel 1 is provided with a sewage outlet 3, and the cover plate 2 is movably arranged on the chemical barrel 1 upper end, the lower end surface of the cover plate 2 is fixedly provided with a buffer layer 4, and a hydraulic cylinder 5 is installed on both sides of ...

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Abstract

The invention discloses a cleaning device for chemical equipment. The device comprises a chemical barrel and a cover plate, a drain outlet is formed in a bottom of the chemical barrel, the cover plateis movably arranged at an upper end of the chemical barrel, a buffer layer is fixedly arranged on a lower end surface of the cover plate, hydraulic cylinders are mounted on two sides of an upper endof the cover plate, a bearing plate is fixedly arranged at tops of the hydraulic cylinders, a hollow steel pipe is movably arranged on the cover plate and the bearing plate and penetrates through a middle position of the cover plate and a middle position of the bearing plate, a plurality of connecting rods are evenly arranged on a surface of a bottom of the hollow steel pipe, and cleaning brushesare installed at the tops of the connecting rods. Cleaning brushes are arranged at the bottom and on the surface of the hollow steel pipe such that an inner wall of the chemical barrel can be cleaned,meanwhile, the bottom of the chemical barrel can be cleaned, the cleaning effect is effectively improved, air is sprayed out by setting an exhaust pipe, internal moisture dissipation is accelerated,and the chemical barrel can conveniently and quickly work next time.

Description

technical field [0001] The invention relates to the technical field of chemical equipment, in particular to a cleaning device for chemical equipment. Background technique [0002] In order to process raw materials into finished products of a certain specification, chemical tanks need to go through a series of chemical processes such as raw material pretreatment, chemical reaction, and separation and purification of reaction products. The equipment used to realize these processes is especially dependent on the production process of chemical products. Disposal of chemical tanks. [0003] The cleaning technology of existing chemical equipment has the following deficiencies: 1. Most of the cleaning methods for chemical barrels are mainly carried out manually, and the inner surface is manually scrubbed with a brush. However, the manual cleaning efficiency is low, and the labor intensity is high, and the cleaning is not enough Clean and not thorough, affecting the effect of clean...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B9/087B08B9/093B08B13/00F26B21/00
CPCB08B9/0808B08B9/0813B08B13/00F26B21/001F26B21/004
Inventor 章红忠
Owner 章红忠