A dual ring susceptor for semiconductor epitaxy system

Abstract

The invention relates to the field of semiconductor epitaxy equipment, in particular to a double-ring type base for a semiconductor epitaxy system. The inner ring comprises an inner ring base, a mainbody of the inner ring base is of a disc structure, and a coaxial boss is arranged on the lower end face of the disc structure; the outer ring base is of an annular structure, a step is arranged on the inner edge of the outer ring base, and the boss on the inner ring base is matched with the step on the inner edge of the outer ring base in shape, so that the inner ring base is embedded in the outer ring base; the lower end face of the inner ring base is connected with a lifting mechanism through an inner ring supporting device. The lower end face of the outer ring base is connected with a rotating mechanism through an outer ring supporting device. According to the invention, the substrate placing action is stable, shaking and collision in the substrate placing process are reduced, and thesubstrate placing accuracy is improved; the outer ring base drives the inner ring base to form a synchronous constant-speed rotating structure, so that the substrate rotates at a constant speed in theheating process of the heating light source, the epitaxial growth of the substrate is more uniform, Meanwhile, the smoothness and flatness of a non-machined surface can be ensured.

Description

technical field [0001] The invention relates to the field of designing semiconductor epitaxy equipment, in particular to a design of a double-ring base for carrying substrates. Background technique [0002] At present, as an epitaxial growth device for growing an epitaxial film on a substrate, there is generally a rotatable base for supporting the substrate provided in the process chamber. In this device, the currently used The pick-up device of the Bernoulli rod transports the substrate. However, when handling large-sized substrates, due to the instability of the Bernoulli rods and the excessive distance between the base and the Bernoulli rods that carry the substrates, the substrates will shake and collide when they are placed, and the placement cannot be guaranteed. Substrate accuracy. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a double-ring susceptor for semiconductor epitaxy system by overcoming the d...

AI Technical Summary

Problems solved by technology

However, when handling large-size substrates, due to the instability of the Bernoulli rods and the excessive distance between the base and the Bernoulli rods that carry the substrates, the substrates will shake and collide when they are placed, and the placement cannot be guaranteed. Substrate Accuracy

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