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A chemical vapor deposition furnace with air intake at both ends

A technology of chemical vapor deposition and deposition furnace, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of product quality reduction, single ventilation direction, uneven coating thickness, etc., and improve processing The effect of improving quality, improving uniformity, and improving stability and reliability

Active Publication Date: 2022-08-05
湖南德智新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Existing chemical vapor deposition furnaces are all furnace bodies with an air inlet at one end and an air outlet at the other end. The ventilation direction is single, and the gas concentration near the air inlet is often higher than that near the air outlet, which will lead to product The coating thickness is not uniform, resulting in lower product quality

Method used

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  • A chemical vapor deposition furnace with air intake at both ends

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Embodiment

[0021] like figure 1 As shown, the chemical vapor deposition furnace with air intake at both ends of this embodiment includes an air intake system 1, a deposition furnace 2, an air extraction system 3 and a control device, and the deposition furnace 2 includes a steel shell 21 and a The graphite crucible 22 of the deposited workpiece, the steel shell 21 is covered outside the graphite crucible 22, the two ends of the deposition furnace 2 are provided with an air inlet 23 and an air outlet 24 that communicate with the graphite crucible 22, and the two air inlets 23 The air inlet system 1 is connected, and the two air outlets 24 are connected to the air extraction system 3; an air inlet 23 and an air outlet 24 distributed at both ends of the deposition furnace 2 are a group, and the control device controls the air inlet 23 and the air outlet 24. Open and close, so that there is only one group of air inlets 23 and air outlets 24 open at the same time.

[0022] In this arrangemen...

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PUM

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Abstract

The invention discloses a chemical vapor deposition furnace with air intake at both ends, comprising an air intake system, a deposition furnace, an air extraction system and a control device. The deposition furnace includes a steel shell and a graphite crucible for accommodating workpieces to be vapor deposited. , the steel shell cover is arranged on the outside of the graphite crucible, the two ends of the deposition furnace are provided with an air inlet and an air outlet that communicate with the graphite crucible, the two air inlets are connected to the air intake system, and the two air outlets are connected to the air extraction system; An air inlet and an air outlet distributed at both ends of the deposition furnace form a group, and the control device controls the opening and closing of the air inlet and the air outlet, so that there is one and only one group of air inlets and air outlets open at the same time. The chemical vapor deposition furnace with air intake at both ends of the invention has the advantages of simplicity and practicality, and can improve the uniformity of internal gas concentration and the uniformity of product coating thickness and the like.

Description

technical field [0001] The invention relates to the field of vapor deposition, in particular to a chemical vapor deposition furnace with air intake at both ends. Background technique [0002] The existing chemical vapor deposition furnaces are all furnace bodies with an air inlet at one end and an air outlet at the other end. The ventilation direction is single, and the gas concentration near the gas inlet is often higher than that near the gas outlet, which will lead to product damage. The thickness of the coating is not uniform, which reduces the quality of the product. SUMMARY OF THE INVENTION [0003] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art, and to provide a simple and practical chemical vapor deposition furnace that can improve the uniformity of internal gas concentration and the uniformity of product coating thickness. [0004] In order to solve the above-mentioned technical problems, the technical...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44C23C16/455C23C16/52
CPCC23C16/44C23C16/45523C23C16/52
Inventor 汪洋刘佳宝万强柴攀其他发明人请求不公开姓名
Owner 湖南德智新材料有限公司