A kind of preparation method of nanometer silicon nitride powder body
A silicon nitride powder and nano-technology, which is applied in the field of preparation of nano-silicon nitride powder, can solve problems affecting product quality, uneven mixing, incomplete nitriding, etc., and achieve low cost, good sphericity, and high efficiency. high effect
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Embodiment 1
[0023] 1. Weigh 1 mol of tetraethyl orthosilicate, 1 mol of glucose, and 1.5 mol of ammonium nitrate, stir the tetraethyl orthosilicate in the alcohol solution evenly, dissolve the glucose and ammonium nitrate in deionized water completely, and deionized water The volume ratio with alcohol is 2:1;
[0024] 2. Mix and stir the two solutions evenly, heat to 50°C and keep stirring until a viscous slurry is formed;
[0025] 3. Put the slurry into a furnace at 300°C to react for 1 hour, accompanied by flowing nitrogen gas, and the gas flow rate is 0.2 L / min. A mixture of silica and carbon is obtained after the reaction;
[0026] 4. React the obtained mixture of silicon dioxide and carbon at 1450° C. with nitrogen gas for 6 hours to obtain a silicon nitride product.
[0027] 5. The particle size of the silicon nitride powder prepared by this scheme is 60nm.
Embodiment 2
[0029] 1. Weigh 1 mol of tetraethyl orthosilicate, 2 mol of glucose, and 1.5 mol of ammonium nitrate, stir the tetraethyl orthosilicate in the alcohol solution evenly, dissolve the glucose and ammonium nitrate in deionized water completely, and deionized water The volume ratio with alcohol is 2:1;
[0030] 2. Mix and stir the two solutions evenly, heat to 50°C and keep stirring until a viscous slurry is formed;
[0031] 3. Put the slurry into a furnace at 300°C to react for 1 hour, accompanied by flowing nitrogen gas, and the gas flow rate is 0.2 L / min. A mixture of silica and carbon is obtained after the reaction;
[0032] 4. React the obtained mixture of silicon dioxide and carbon at 1450° C. with nitrogen gas for 4 hours to obtain a silicon nitride product.
[0033] 5. The particle size of the silicon nitride powder prepared by this scheme is 50nm.
Embodiment 3
[0035] 1. Weigh 1 mol of tetraethyl orthosilicate, 1 mol of glucose, and 1.5 mol of ammonium nitrate, stir the tetraethyl orthosilicate in the alcohol solution evenly, dissolve the glucose and ammonium nitrate in deionized water completely, and deionized water The volume ratio with alcohol is 2:1;
[0036] 2. Mix and stir the two solutions evenly, heat to 40°C and keep stirring until a viscous slurry is formed;
[0037] 3. Put the slurry into a furnace at 350°C for 1.5 hours, accompanied by flowing argon gas, and the gas flow rate is 0.1 L / min. A mixture of silica and carbon is obtained after the reaction;
[0038] 4. React the obtained mixture of silicon dioxide and carbon at 1400° C. with nitrogen gas for 6 hours to obtain a silicon nitride product.
[0039] 5. The particle size of the silicon nitride powder prepared by this scheme is 70nm.
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