nto transparent conductive substrate and preparation method thereof
A technology of transparent conductive and conductive substrates, which is applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of poor hardness and corrosion resistance, and high prices of transparent conductive substrates, so as to improve light transmission performance, and the preparation process is environmentally friendly and economical. The effect of increasing concentration
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[0039] Based on the above structure, as figure 1 and figure 2 As shown, the present invention also proposes a preparation method of an NTO transparent conductive substrate, the preparation method at least comprises the steps of:
[0040] S1: Provide a transparent support substrate 1;
[0041] S2: forming an anti-reflection layer 2 and a barrier layer 3 on the transparent support substrate 1, wherein the anti-reflection layer 2 is formed on the upper surface of the barrier layer 3 (eg figure 2 shown) or the barrier layer 3 is formed on the upper surface of the anti-reflection layer 2 (such as figure 1 shown);
[0042] S3: forming an NTO conductive layer 4 on the surface of the structure obtained in step S2.
[0043] As an example, the anti-reflection layer 2, the barrier layer 3 and the NTO conductive layer 4 can be formed by any suitable deposition process, for example, chemical vapor deposition (CVD), magnetron sputtering, pulsed laser deposition can be used (PLD), su...
Embodiment 1
[0049] This embodiment is a transparent conductive glass substrate used in solar cells, such as figure 1 As shown, it includes: a transparent support substrate 1, an anti-reflection layer 2, a barrier layer 3 and an NTO conductive layer 4 in sequence. The material of the antireflection layer 2 is nitrogen-doped tin oxide (SnO 2 : N), the material of the barrier layer 3 is silicon oxide (SiO 2 ).
[0050] The preparation process is as follows:
[0051] a) Provide a 3.2mm thick ultra-white float glass 1, after cleaning it, deposit about 10nm of nitrogen-doped tin oxide (SnO) on its surface 2 : N) film as antireflection layer 2;
[0052] b) Take out the sample in step a, and grow a layer of silicon oxide (SiO) with a thickness of 20 nm on its surface 2 ) film as barrier layer 3;
[0053] c) After taking out the sample in step b, deposit an NTO film of about 300 nm on its surface as the conductive layer 4;
[0054] That is, the required NTO transparent conductive glass subs...
Embodiment 2
[0056] Transparent conductive glass substrates used in solar cells, such as figure 1 As shown, it sequentially includes: a transparent support substrate 1 , an anti-reflection layer 2 , a barrier layer 3 and an NTO conductive layer 4 . The material of the antireflection layer 2 is fluorine-doped tin oxide (SnO 2 : F, FTO), the material of the barrier layer 3 is titanium nitride (Ti 2 N 3 ).
[0057] The preparation process is as follows:
[0058] a) Provide ultra-white float glass 1 with a thickness of 5 mm, and after cleaning it, deposit about 10 nm of fluorine-doped tin oxide (SnO) on its surface. 2 : F, FTO) film as antireflection layer 2;
[0059] b) Take out the sample in step a, and grow a layer of titanium nitride (TiN) with a thickness of 20 nm on its surface 2 N 3 ) film as barrier layer 3;
[0060] c) After taking out the sample in step b, deposit an NTO film of about 300 nm on its surface as the conductive layer 4;
[0061] That is, the required NTO transpa...
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