Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Moisturizing mask and preparation method thereof

A wet face and extract technology, applied in the field of moisturizing facial mask and its preparation, can solve the problems of facial skin redness, obvious toxic and side effects, skin irritation, etc., and achieve the effects of promoting proliferation and differentiation, enhancing skin moisture, and protecting skin

Inactive Publication Date: 2020-05-15
包计贤
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] There are many types of facial masks on the market and their quality is uneven, but most of them are chemical ingredients. Although the short-term curative effect is fast, the toxic and side effects are obvious. Even some facial masks contain hormone components, which are very irritating to the skin after use. Cause facial skin redness, peeling and other hazards

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Moisturizing mask and preparation method thereof
  • Moisturizing mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0114] The 4th aspect of the present invention provides the preparation method of described moisturizing mask, comprises the following steps:

[0115] (1) Mix water, emollient, emulsifier, thickener, complexing slow-release agent, humectant and preservative, heat to 70-90°C while stirring, and then homogenize for 5-15min to obtain a mixture;

[0116] (2) Lower the mixture to 30-50°C, then add the moisturizing composition, pH regulator, bacteriostat and essence in sequence, after stirring evenly, pump air, filter, and discharge to obtain the moisturizing mask essence;

[0117] (3) Immerse the base of the mask in the moisturizing mask essence and keep it for 10-50 minutes, then take it out to get the product.

Embodiment 1

[0121] Embodiment 1 provides a kind of moisturizing mask essence, comprising the following components: 0.07 part of sodium hyaluronate, 1 part of betaine, 0.3 part of sugar isomers, 0.3 part of nicotinamide, 0.3 part of acetyl chitosan amine 2.2 parts of plant extracts, 100 parts of water, 1.3 parts of emollients, 0.3 parts of emulsifiers, 0.1 parts of thickeners, 0.01 parts of complex release agents, 8.3 parts of humectants, 0.25 parts of preservatives, and 0.08 parts of pH regulators part, 0.5 part of antibacterial agent, and 0.005 part of essence.

[0122] The sodium hyaluronate is a combination of high molecular weight sodium hyaluronate and sodium hyaluronate cross-linked polymer, the weight ratio is 1:2.5; the molecular weight of the high molecular weight sodium hyaluronate is greater than 1800KDa; the hyaluronic acid Both sodium and sodium hyaluronate cross-linked polymers were purchased from Bloomage Freda Biomedical Co., Ltd., with a trade name of HA-THM; the betaine ...

Embodiment 2

[0128] The difference between Example 2 and Example 1 is that the moisturizing facial mask essence includes the following components in parts by weight: 0.01 part of sodium hyaluronate, 0.1 part of betaine, 0.1 part of sugar isomers, 0.1 part of nicotinamide, 0.1 part of acetyl chitosan amine, 1 part of plant extract, 100 parts of water, 1 part of emollient, 0.1 part of emulsifier, 0.01 part of thickener, 0.005 part of complexing slow-release agent, 5 parts of humectant 0.1 part preservative, 0.01 part pH regulator, 0.1 part antibacterial agent, 0.001 part essence.

[0129] The weight ratio of the high-molecular sodium hyaluronate and sodium hyaluronate cross-linked polymer is 1:1; the weight ratio of the celestiaceae extract, the extract of Spirulina maxima and the plant essence of Ou Shumin is 1: 0.8:0.05; the weight ratio of triglyceride (ethylhexanoate), octyl polymethicone and macadamia nut seed oil is 2:3:1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
molecular weightaaaaaaaaaa
melting pointaaaaaaaaaa
Login to View More

Abstract

The invention relates to the technical field of cosmetics, in particular to a moisturizing mask and a preparation method thereof. A moisturizing composition provided by the invention is characterizedby comprising the following components in parts by weight: 0.01 to 0.2 part of sodium hyaluronate, 0.1 to 3 parts of glycine betaine, 0.1 to 1 part of saccharide isomeride, 0.1 to 1 part of nicotinamide, 0.1 to 1 part of acetyl chitosan amine and 1 to 3 parts of plant extract. The invention further provides the moisturizing mask. The moisturizing mask comprises moisturizing mask essence and a masksubstrate, wherein the moisturizing mask essence is prepared from the moisturizing composition. The moisturizing mask provided by the invention solves the problems of water shortage and dryness of askin surface, forms a breathable film, and can quickly permeate, improve the moisturizing and water-locking capabilities of the skin from the bottom of the skin, promote the proliferation and differentiation of epidermal cells, reduce dry lines and fine lines caused by water shortage, prevent and repair skin injuries and recover gloss and elasticity of the skin.

Description

technical field [0001] The invention relates to the technical field of cosmetics, in particular to a moisturizing facial mask and a preparation method thereof. Background technique [0002] Due to the serious pollution of the global environment, the external environmental factors of the human body have deteriorated sharply. Environmental factors such as strong ultraviolet rays, smog, dust and dry wind have caused the skin to suffer great torture, and the skin is prone to skin damage due to long-term external pressure. The condition is out of balance, and discomfort symptoms such as dryness, tightness, peeling, itching, etc. appear, so it is necessary to continuously add enough moisture to the skin to relieve the above discomfort symptoms. In addition, the skin is the body's protective organ that prevents bacterial invasion and moisture loss. If the skin is damaged, it will become dry, sensitive, weakened immunity, prone to dark spots, and wrinkles. Therefore, it is importan...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/99A61K8/44A61K8/67A61K8/73A61Q19/00
CPCA61K8/44A61K8/673A61K8/735A61K8/736A61K8/9789A61K8/9794A61K8/99A61Q19/00
Inventor 包计贤
Owner 包计贤
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com