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Leveling device and reaction chamber

A leveling device and chamber technology, which is applied in the manufacture of electrical components, circuits, semiconductor/solid-state devices, etc., can solve the problems of heavy workload, affecting work efficiency, and long time, so as to improve work efficiency and reduce leveling time. , convenient and quick leveling effect

Active Publication Date: 2021-12-17
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has a large workload and takes a long time, which affects work efficiency.

Method used

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  • Leveling device and reaction chamber
  • Leveling device and reaction chamber
  • Leveling device and reaction chamber

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Embodiment Construction

[0032] In order for those skilled in the art to better understand the technical solution of the present invention, the alignment component and the reaction chamber provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0033] Such as Figure 1-Figure 4 As shown, this embodiment provides a leveling device, which includes elastic connectors, at least three leveling screws 3 and a leveling plate 1 for carrying support columns 4, wherein the leveling plate 1 is connected to the bottom of the chamber through the elastic connectors. The wall 5 is elastically connected; at least three threaded holes penetrating through the thickness of the leveling plate 1 are arranged at intervals along the circumferential direction of the leveling plate 1; each leveling screw 3 is matched with each threaded hole one by one, And the lower end of each leveling screw 3 is against the bottom wall 5 of the chamber.

[0034] In the leveling dev...

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Abstract

The present invention provides a leveling device and a reaction chamber, comprising elastic connectors, at least three leveling screws and a leveling plate for carrying support columns, wherein the leveling plate is elastically connected to the bottom wall of the chamber through the elastic connectors; At least three threaded holes penetrating through the thickness of the leveling plate are arranged at intervals along the circumference of the leveling plate; each leveling screw is matched with each threaded hole one by one, and the lower end of each leveling screw against the bottom wall of the chamber. The leveling device and the reaction chamber provided by the present invention can conveniently and quickly level a plurality of support columns, reduce leveling time, and improve work efficiency.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a leveling device and a reaction chamber. Background technique [0002] At present, in semiconductor equipment, the chamber is usually provided with a base for carrying the substrate during the process, and a plurality of support columns that can pass through a plurality of through holes distributed in the base. A plurality of support columns in the middle lift the substrate, so that there is a certain distance between the substrate and the base, so that the manipulator can have space to enter the lower surface of the substrate to pick and place the substrate. In order to ensure the quality of film formation on the substrate, the base and multiple support columns need to be adjusted to the level. [0003] The bottoms of the existing multiple supporting columns are in direct contact with the bottom surface of the chamber, and the level of the bottom surface of the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/68H01L21/687
CPCH01L21/67H01L21/68H01L21/68714H01L21/68742H01L21/6875
Inventor 王勇飞兰云峰王帅伟
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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