Reciprocating type rotary CVD equipment and application method

A reciprocating, equipment technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve problems such as difficulty in obtaining high-quality deposited films, achieve simple and reliable electrical and cooling connections, optimal film The effect of deposition uniformity, streamlined design

Active Publication Date: 2020-07-03
BETONE TECH SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The invention can be used to solve the problem that CVD equipment in the prior art is difficult to obtain a high-quality deposited film with good uniformity on the wafer surface

Method used

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  • Reciprocating type rotary CVD equipment and application method
  • Reciprocating type rotary CVD equipment and application method
  • Reciprocating type rotary CVD equipment and application method

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Embodiment Construction

[0038] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention. For example, when describing the embodiments of the present invention in detail, for the convenience of explanation, the cross-sectional view showing the device structure will not be partially enlarged according to the general scale, and the schematic diagram is only an example, which should not limit the protection scope of the present invention. In addition, the three-dimensional space dimensions of length, width and depth should be in...

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Abstract

The invention provides reciprocating type rotary CVD equipment and an application method. The reciprocating type rotary CVD equipment comprises a cavity, a wafer heating base and a rotating device, the rotating device is located outside the cavity and comprises a rotary power mechanism and a rotary sealing mechanism, and the rotary sealing mechanism comprises a rotating part and a fixed part; andthe fixed part is fixedly connected with the cavity in a sealed mode, the rotating part is fixedly connected with the wafer heating base in a sealed mode, the rotating part is movably connected with the fixed part in a sealed mode, the rotating part is connected with the rotary power mechanism, and the rotary power mechanism drives the rotating part and the wafer heating base to perform reciprocating rotary operation. According to the reciprocating type rotary CVD equipment, through the rotation of the rotating device, the uniformity of thin film deposition in the circumferential direction ofthe wafer can be improved, and the manufacturing cost of equipment and the wafer is reduced.

Description

technical field [0001] The invention belongs to the field of chemical vapor deposition technology and semiconductor equipment manufacturing, and in particular relates to a reciprocating rotary CVD equipment and an application method. Background technique [0002] Chemical Vapor Deposition (CVD, Chemical Vapor Deposition) is a technique widely used in the semiconductor industry to deposit thin films. CVD equipment includes a reaction chamber and a wafer heating base. When two or more gaseous raw materials are introduced into the reaction chamber , the gaseous raw materials react chemically with each other to form a new material and deposit it on the surface of the heated base wafer to form a deposited film. [0003] With the development of vapor deposition technology, the functions of CVD equipment are becoming more and more mature and perfect. In order to adapt to the current semiconductor industry's continuous pursuit of high quality, high efficiency, low cost and adapting ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/458C23C16/52
CPCC23C16/4581C23C16/52C23C16/4584C23C16/4586C23C16/4408C23C16/463C23C16/4409C23C16/505
Inventor 金小亮宋维聪李中云
Owner BETONE TECH SHANGHAI
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